JPS5636160A - Schottky barrier type semiconductor device - Google Patents

Schottky barrier type semiconductor device

Info

Publication number
JPS5636160A
JPS5636160A JP11135579A JP11135579A JPS5636160A JP S5636160 A JPS5636160 A JP S5636160A JP 11135579 A JP11135579 A JP 11135579A JP 11135579 A JP11135579 A JP 11135579A JP S5636160 A JPS5636160 A JP S5636160A
Authority
JP
Japan
Prior art keywords
film
metal
oxide film
molybdenum
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11135579A
Other languages
English (en)
Inventor
Kenji Hideshima
Toshio Takagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP11135579A priority Critical patent/JPS5636160A/ja
Publication of JPS5636160A publication Critical patent/JPS5636160A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/47Schottky barrier electrodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)
JP11135579A 1979-08-31 1979-08-31 Schottky barrier type semiconductor device Pending JPS5636160A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11135579A JPS5636160A (en) 1979-08-31 1979-08-31 Schottky barrier type semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11135579A JPS5636160A (en) 1979-08-31 1979-08-31 Schottky barrier type semiconductor device

Publications (1)

Publication Number Publication Date
JPS5636160A true JPS5636160A (en) 1981-04-09

Family

ID=14559085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11135579A Pending JPS5636160A (en) 1979-08-31 1979-08-31 Schottky barrier type semiconductor device

Country Status (1)

Country Link
JP (1) JPS5636160A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5914354U (ja) * 1982-07-16 1984-01-28 日本電気ホームエレクトロニクス株式会社 Dhd型シヨツトキ−ダイオ−ド
JPH03183677A (ja) * 1980-10-02 1991-08-09 Xerox Corp 電気光学導波体層の形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03183677A (ja) * 1980-10-02 1991-08-09 Xerox Corp 電気光学導波体層の形成方法
JPS5914354U (ja) * 1982-07-16 1984-01-28 日本電気ホームエレクトロニクス株式会社 Dhd型シヨツトキ−ダイオ−ド

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