JPS5627639A - Plasma monitor - Google Patents

Plasma monitor

Info

Publication number
JPS5627639A
JPS5627639A JP10314279A JP10314279A JPS5627639A JP S5627639 A JPS5627639 A JP S5627639A JP 10314279 A JP10314279 A JP 10314279A JP 10314279 A JP10314279 A JP 10314279A JP S5627639 A JPS5627639 A JP S5627639A
Authority
JP
Japan
Prior art keywords
electrodes
slit
flat plate
state
parallel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10314279A
Other languages
Japanese (ja)
Other versions
JPS6013460B2 (en
Inventor
Norio Kanai
Kunio Harada
Shinya Iida
Tatsumi Mizutani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10314279A priority Critical patent/JPS6013460B2/en
Publication of JPS5627639A publication Critical patent/JPS5627639A/en
Publication of JPS6013460B2 publication Critical patent/JPS6013460B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To enable optimum control of operation by measuring the light emission strength of the desired part of plasma generated between parallel flat plate type electrodes via a slit in parallel with the electrodes. CONSTITUTION:Between a peep window 5 and a spectroscope 4, a slit 9 which is almost in parallel with flat plate electrodes 2 and 6 is installed. Dividing plasma generated between the flat plate electrodes 2 and 6 in layers by moving the slit 9 and the spectroscope 4 in succession, spectrophotometry is carried out in succession. As the state of plasma generation between the electrodes 2 and 6 can be measured, relation between the state of plasma generation and the state of working can be found and optimum control of etching, etc., can be carried out.
JP10314279A 1979-08-15 1979-08-15 plasma monitor Expired JPS6013460B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10314279A JPS6013460B2 (en) 1979-08-15 1979-08-15 plasma monitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10314279A JPS6013460B2 (en) 1979-08-15 1979-08-15 plasma monitor

Publications (2)

Publication Number Publication Date
JPS5627639A true JPS5627639A (en) 1981-03-18
JPS6013460B2 JPS6013460B2 (en) 1985-04-08

Family

ID=14346267

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10314279A Expired JPS6013460B2 (en) 1979-08-15 1979-08-15 plasma monitor

Country Status (1)

Country Link
JP (1) JPS6013460B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0081785A2 (en) * 1981-12-11 1983-06-22 Hitachi, Ltd. Plasma monitor
JPS613626A (en) * 1984-06-15 1986-01-09 Hokuriku Kogyo Kk Manufacture of forging die for long member
JPS6140138U (en) * 1984-08-14 1986-03-13 東京エレクトロン相模株式会社 Plasma treatment end point detection device
JP2008298449A (en) * 2007-05-29 2008-12-11 Kobe Steel Ltd Plasma constituent element analyzer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0081785A2 (en) * 1981-12-11 1983-06-22 Hitachi, Ltd. Plasma monitor
JPS613626A (en) * 1984-06-15 1986-01-09 Hokuriku Kogyo Kk Manufacture of forging die for long member
JPS6140138U (en) * 1984-08-14 1986-03-13 東京エレクトロン相模株式会社 Plasma treatment end point detection device
JP2008298449A (en) * 2007-05-29 2008-12-11 Kobe Steel Ltd Plasma constituent element analyzer

Also Published As

Publication number Publication date
JPS6013460B2 (en) 1985-04-08

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