JPS5625740A - Lithographic plate not requiring damping water - Google Patents

Lithographic plate not requiring damping water

Info

Publication number
JPS5625740A
JPS5625740A JP10174179A JP10174179A JPS5625740A JP S5625740 A JPS5625740 A JP S5625740A JP 10174179 A JP10174179 A JP 10174179A JP 10174179 A JP10174179 A JP 10174179A JP S5625740 A JPS5625740 A JP S5625740A
Authority
JP
Japan
Prior art keywords
layer
photosensitive
resin
rubber
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10174179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6346407B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Takao Kinashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP10174179A priority Critical patent/JPS5625740A/ja
Publication of JPS5625740A publication Critical patent/JPS5625740A/ja
Publication of JPS6346407B2 publication Critical patent/JPS6346407B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP10174179A 1979-08-09 1979-08-09 Lithographic plate not requiring damping water Granted JPS5625740A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10174179A JPS5625740A (en) 1979-08-09 1979-08-09 Lithographic plate not requiring damping water

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10174179A JPS5625740A (en) 1979-08-09 1979-08-09 Lithographic plate not requiring damping water

Publications (2)

Publication Number Publication Date
JPS5625740A true JPS5625740A (en) 1981-03-12
JPS6346407B2 JPS6346407B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-09-14

Family

ID=14308665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10174179A Granted JPS5625740A (en) 1979-08-09 1979-08-09 Lithographic plate not requiring damping water

Country Status (1)

Country Link
JP (1) JPS5625740A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5845094A (ja) * 1981-09-10 1983-03-16 Toray Ind Inc 湿し水不要平版印刷版

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5845094A (ja) * 1981-09-10 1983-03-16 Toray Ind Inc 湿し水不要平版印刷版

Also Published As

Publication number Publication date
JPS6346407B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-09-14

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