JPS5625730A - Positive type photoresist composition - Google Patents
Positive type photoresist compositionInfo
- Publication number
- JPS5625730A JPS5625730A JP10029679A JP10029679A JPS5625730A JP S5625730 A JPS5625730 A JP S5625730A JP 10029679 A JP10029679 A JP 10029679A JP 10029679 A JP10029679 A JP 10029679A JP S5625730 A JPS5625730 A JP S5625730A
- Authority
- JP
- Japan
- Prior art keywords
- org
- solvent
- polycondensate
- positive type
- photoresist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 2
- 229920005989 resin Polymers 0.000 abstract 4
- 239000011347 resin Substances 0.000 abstract 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract 3
- 239000002904 solvent Substances 0.000 abstract 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 2
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 abstract 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 abstract 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 abstract 1
- OWPBOKWFRAIKTD-UHFFFAOYSA-N 5-[(3-formyl-4-hydroxyphenyl)methyl]-2-hydroxybenzaldehyde Chemical compound C1=C(C=O)C(O)=CC=C1CC1=CC=C(O)C(C=O)=C1 OWPBOKWFRAIKTD-UHFFFAOYSA-N 0.000 abstract 1
- MPGOFFXRGUQRMW-UHFFFAOYSA-N [N-]=[N+]=[N-].[N-]=[N+]=[N-].O=C1C=CC=CC1=O Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].O=C1C=CC=CC1=O MPGOFFXRGUQRMW-UHFFFAOYSA-N 0.000 abstract 1
- 229960000583 acetic acid Drugs 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 239000002585 base Substances 0.000 abstract 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 abstract 1
- 239000012362 glacial acetic acid Substances 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical group ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10029679A JPS5625730A (en) | 1979-08-08 | 1979-08-08 | Positive type photoresist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10029679A JPS5625730A (en) | 1979-08-08 | 1979-08-08 | Positive type photoresist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5625730A true JPS5625730A (en) | 1981-03-12 |
| JPS6352372B2 JPS6352372B2 (enrdf_load_stackoverflow) | 1988-10-18 |
Family
ID=14270201
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10029679A Granted JPS5625730A (en) | 1979-08-08 | 1979-08-08 | Positive type photoresist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5625730A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0967421A (ja) * | 1995-08-30 | 1997-03-11 | Toshiba Corp | 機能性有機材料、機能性有機樹脂組成物、光透過性の制御方法および着色薄膜パターンの製造方法 |
| JP2002332347A (ja) * | 2001-05-09 | 2002-11-22 | Toshio Masuda | サリチリデンアニリン系重合体、その製造方法及びそれを用いたマルチカラー発光材料 |
| JP2019210326A (ja) * | 2018-05-31 | 2019-12-12 | 群栄化学工業株式会社 | ポリイミン、ワニス、フィルム及びその製造方法、硬化フィルム及びその製造方法、並びに積層体及びその製造方法 |
-
1979
- 1979-08-08 JP JP10029679A patent/JPS5625730A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0967421A (ja) * | 1995-08-30 | 1997-03-11 | Toshiba Corp | 機能性有機材料、機能性有機樹脂組成物、光透過性の制御方法および着色薄膜パターンの製造方法 |
| JP2002332347A (ja) * | 2001-05-09 | 2002-11-22 | Toshio Masuda | サリチリデンアニリン系重合体、その製造方法及びそれを用いたマルチカラー発光材料 |
| JP2019210326A (ja) * | 2018-05-31 | 2019-12-12 | 群栄化学工業株式会社 | ポリイミン、ワニス、フィルム及びその製造方法、硬化フィルム及びその製造方法、並びに積層体及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6352372B2 (enrdf_load_stackoverflow) | 1988-10-18 |
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