JPS56169763A - Device for electroless copper plating - Google Patents

Device for electroless copper plating

Info

Publication number
JPS56169763A
JPS56169763A JP7181880A JP7181880A JPS56169763A JP S56169763 A JPS56169763 A JP S56169763A JP 7181880 A JP7181880 A JP 7181880A JP 7181880 A JP7181880 A JP 7181880A JP S56169763 A JPS56169763 A JP S56169763A
Authority
JP
Japan
Prior art keywords
solution
plating
replenishing
plating solution
feed pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7181880A
Other languages
Japanese (ja)
Other versions
JPS589150B2 (en
Inventor
Yoshiyuki Tsuru
Koji Kamiyama
Norizo Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP7181880A priority Critical patent/JPS589150B2/en
Publication of JPS56169763A publication Critical patent/JPS56169763A/en
Publication of JPS589150B2 publication Critical patent/JPS589150B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Chemically Coating (AREA)

Abstract

PURPOSE: To prevent the clogging of a tip end of a feed pipe for a replenishing solution, by a method wherein a circulating pipe for a plating solution and the feed pipe for intermittently feeding the replenishing solution into the plating solution through one end thereof opening into the plating solution are provided for a plating tank, and a liquid which does not cause a bursting reaction even upon contact with the plating solution or the replenishing solution is flowed into the feed pipe.
CONSTITUTION: The device for electroless copper plating is provided with the circulating pipe 2 for circulating the plating solution as required, and a supplying device 8, 5 for replenishing solution which has the feed pipe for replenishing solution 6 opening into the plating solution and which supplies the replenishing solution intermittently into the plating solution. The liquid which does not cause the bursting reaction even when contacted with the plating solution or the replenishing solution, e.g. water, is constantly flowed from a tank 15 into the feed pipe 6 by a pump 16 used for adding the replenishing solution. Namely, the replenishing solution is intermittently added to the water flowing constantly, and the mixture of both liquids is added into the plating solution.
COPYRIGHT: (C)1981,JPO&Japio
JP7181880A 1980-05-28 1980-05-28 Electroless copper plating equipment Expired JPS589150B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7181880A JPS589150B2 (en) 1980-05-28 1980-05-28 Electroless copper plating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7181880A JPS589150B2 (en) 1980-05-28 1980-05-28 Electroless copper plating equipment

Publications (2)

Publication Number Publication Date
JPS56169763A true JPS56169763A (en) 1981-12-26
JPS589150B2 JPS589150B2 (en) 1983-02-19

Family

ID=13471507

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7181880A Expired JPS589150B2 (en) 1980-05-28 1980-05-28 Electroless copper plating equipment

Country Status (1)

Country Link
JP (1) JPS589150B2 (en)

Also Published As

Publication number Publication date
JPS589150B2 (en) 1983-02-19

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