JPS56163072A - Hardening method for flux residue coating film for soldering - Google Patents

Hardening method for flux residue coating film for soldering

Info

Publication number
JPS56163072A
JPS56163072A JP6749980A JP6749980A JPS56163072A JP S56163072 A JPS56163072 A JP S56163072A JP 6749980 A JP6749980 A JP 6749980A JP 6749980 A JP6749980 A JP 6749980A JP S56163072 A JPS56163072 A JP S56163072A
Authority
JP
Japan
Prior art keywords
coating film
flux residue
soldering
photopolymerizable
photopolymerization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6749980A
Other languages
Japanese (ja)
Other versions
JPS6043228B2 (en
Inventor
Takao Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tamura Kaken Corp
Original Assignee
Tamura Kaken Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tamura Kaken Corp filed Critical Tamura Kaken Corp
Priority to JP6749980A priority Critical patent/JPS6043228B2/en
Publication of JPS56163072A publication Critical patent/JPS56163072A/en
Publication of JPS6043228B2 publication Critical patent/JPS6043228B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To harden a flux residue coating film through light irradiation by coating a photopolymerization hardener consisting of one or more kinds of a resin having photopolymerizable functional groups, a photopolymerizable oligomer and a photopolymerizable monomer and a photopolymerization initiator on the flux residue coating film after soldering.
CONSTITUTION: The photopolymerization hardener consisting of one or more kinds of a resin having photopolymerizable functional groups such as acrylic modified or methacrylic modified unsaturated plyester or epoxy acrylate, a photopolymerizable oligomer such as polyethylene glycol diacrylate or trimethylolpropane diacrylate and a photopolymerizable monomer such as allylalcobal, dihydroxy ethylocrylate, and a photopolymerization initiator such as dibenzoyl or benzoin is coated on the flux residue coating film after soldering. Thereafter, light is irradiated thereto, thereby allowing photopolymerization reaction to take place.
COPYRIGHT: (C)1981,JPO&Japio
JP6749980A 1980-05-20 1980-05-20 Curing method of flux residue coating film for soldering Expired JPS6043228B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6749980A JPS6043228B2 (en) 1980-05-20 1980-05-20 Curing method of flux residue coating film for soldering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6749980A JPS6043228B2 (en) 1980-05-20 1980-05-20 Curing method of flux residue coating film for soldering

Publications (2)

Publication Number Publication Date
JPS56163072A true JPS56163072A (en) 1981-12-15
JPS6043228B2 JPS6043228B2 (en) 1985-09-27

Family

ID=13346734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6749980A Expired JPS6043228B2 (en) 1980-05-20 1980-05-20 Curing method of flux residue coating film for soldering

Country Status (1)

Country Link
JP (1) JPS6043228B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104772581A (en) * 2015-04-28 2015-07-15 苏州永创达电子有限公司 Flux

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104772581A (en) * 2015-04-28 2015-07-15 苏州永创达电子有限公司 Flux
CN104772581B (en) * 2015-04-28 2016-07-06 苏州永创达电子有限公司 A kind of scaling powder

Also Published As

Publication number Publication date
JPS6043228B2 (en) 1985-09-27

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