JPS561628B2 - - Google Patents
Info
- Publication number
- JPS561628B2 JPS561628B2 JP746773A JP746773A JPS561628B2 JP S561628 B2 JPS561628 B2 JP S561628B2 JP 746773 A JP746773 A JP 746773A JP 746773 A JP746773 A JP 746773A JP S561628 B2 JPS561628 B2 JP S561628B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Laminated Bodies (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photoreceptors In Electrophotography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19722202357 DE2202357C3 (de) | 1972-01-19 | 1972-01-19 | Photopolymerisierbares Aufzeichnungsmaterial und Verfahren zu seiner Herstellung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4882903A JPS4882903A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1973-11-06 |
| JPS561628B2 true JPS561628B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-01-14 |
Family
ID=5833381
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP746773A Expired JPS561628B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1972-01-19 | 1973-01-18 |
Country Status (9)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5090404A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-12-13 | 1975-07-19 | ||
| FR2455305A1 (fr) * | 1979-04-24 | 1980-11-21 | Uk Poligrafichesky Instit | Composition adhesive antihalo pour la preparation de cliches en photopolymeres sur supports metalliques |
| FR2457512A1 (fr) * | 1979-05-22 | 1980-12-19 | Uk Poligrafichesky Instit | Composition adhesive-antihalo pour la preparation de cliches en photopolymeres sur supports metalliques |
| DE3032134A1 (de) * | 1979-08-28 | 1981-03-19 | Fuji Photo Film Co. Ltd., Minami-Ashigara, Kanagawa | Lichtempfindliches bildausbildungsmaterial |
| DE3045516A1 (de) | 1980-12-03 | 1982-07-08 | Basf Ag, 6700 Ludwigshafen | Lichtempfindliches mehrschichtenmaterial und verfahren zur herstellung von haftschichten dafuer |
| JPS609799A (ja) * | 1983-06-29 | 1985-01-18 | Toray Ind Inc | 湿し水不要平版印刷版 |
| DE102013201392A1 (de) | 2013-01-29 | 2014-07-31 | Evonik Industries Ag | Haftvermittler- und Primer-Zusammensetzungen für Metall-Kunststoff-Hybridbauteile |
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1972
- 1972-01-19 DE DE19722202357 patent/DE2202357C3/de not_active Expired
-
1973
- 1973-01-16 CA CA161,340A patent/CA1014404A/en not_active Expired
- 1973-01-16 CH CH56473A patent/CH582367A5/xx not_active IP Right Cessation
- 1973-01-18 IT IT4776073A patent/IT988099B/it active
- 1973-01-18 AT AT38673A patent/AT321955B/de not_active IP Right Cessation
- 1973-01-18 JP JP746773A patent/JPS561628B2/ja not_active Expired
- 1973-01-18 GB GB261973A patent/GB1409015A/en not_active Expired
- 1973-01-19 FR FR7302003A patent/FR2168577B1/fr not_active Expired
- 1973-01-19 BE BE794260D patent/BE794260A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| IT988099B (it) | 1975-04-10 |
| JPS4882903A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1973-11-06 |
| AT321955B (de) | 1975-04-25 |
| DE2202357A1 (de) | 1973-07-26 |
| FR2168577A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1973-08-31 |
| BE794260A (fr) | 1973-07-19 |
| DE2202357B2 (de) | 1980-04-03 |
| GB1409015A (en) | 1975-10-08 |
| CH582367A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-11-30 |
| DE2202357C3 (de) | 1980-12-04 |
| CA1014404A (en) | 1977-07-26 |
| FR2168577B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-08-27 |