FR2455305A1 - Composition adhesive antihalo pour la preparation de cliches en photopolymeres sur supports metalliques - Google Patents
Composition adhesive antihalo pour la preparation de cliches en photopolymeres sur supports metalliquesInfo
- Publication number
- FR2455305A1 FR2455305A1 FR7910342A FR7910342A FR2455305A1 FR 2455305 A1 FR2455305 A1 FR 2455305A1 FR 7910342 A FR7910342 A FR 7910342A FR 7910342 A FR7910342 A FR 7910342A FR 2455305 A1 FR2455305 A1 FR 2455305A1
- Authority
- FR
- France
- Prior art keywords
- proportion
- printing elements
- halation
- mixture
- crosslinking agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
L'INVENTION CONCERNE LES ARTS GRAPHIQUES. LA COMPOSITION FAISANT L'OBJET DE L'INVENTION EST DU TYPE COMPRENANT UN COMPOSANT ANTIHALO, UN ADHESIF ET UN DURCISSEUR, ET EST CARACTERISEE EN CE QUE, A TITRE DE COMPOSANT ANTIHALO, ELLE CONTIENT DU DIOXYDE DE TITANE, A TITRE D'ADHESIF, UNE RESINE EPOXYDECONTENANT DU BIS (P-HYDROXYPHENYL)-2,2 PROPANE, ET A TITRE DE DURCISSEUR, UNE POLYAMINE ALIPHATIQUE. LES PROPORTIONS DES COMPOSANTS SONT NOTAMMENT LES SUIVANTS ( EN POIDS):-DIOXYDE DE TITANE: 20 A 25;-POLYAMINE ALIPHATIQUE: 10 A 15;-RESINE EPOXYDE CONTENANT DU BIS (P-HYDROXYPHENYL)-2,2 PROPANE: LE COMPLEMENT A 100. LES CLICHES OBTENUS SONT DESTINES EN PARTICULIER A L'IMPRESSION TYPOGRAPHIQUE SUR PRESSES A PLAT OU SUR ROTATIVES, AINSI QUE DANS LES TRAVAUX OFFSET OU OFFSET TYPOGRAPHIQUES.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7910342A FR2455305A1 (fr) | 1979-04-24 | 1979-04-24 | Composition adhesive antihalo pour la preparation de cliches en photopolymeres sur supports metalliques |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7910342A FR2455305A1 (fr) | 1979-04-24 | 1979-04-24 | Composition adhesive antihalo pour la preparation de cliches en photopolymeres sur supports metalliques |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2455305A1 true FR2455305A1 (fr) | 1980-11-21 |
FR2455305B1 FR2455305B1 (fr) | 1982-06-18 |
Family
ID=9224662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7910342A Granted FR2455305A1 (fr) | 1979-04-24 | 1979-04-24 | Composition adhesive antihalo pour la preparation de cliches en photopolymeres sur supports metalliques |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2455305A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0242143A2 (fr) * | 1986-04-11 | 1987-10-21 | Toray Industries, Inc. | Plaque pour l'impression |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3178378A (en) * | 1960-05-31 | 1965-04-13 | Gen Aniline & Film Corp | Subbing layer for hydrophobic, dimensionally stable, inert-surfaced photographic filmbase |
DE1572303A1 (de) * | 1967-04-11 | 1970-01-08 | Basf Ag | Verfahren zum Aufbringen lichtempfindlicher Schichten aus Polyamiden auf metallische Unterlagen |
DE2031476A1 (de) * | 1969-06-25 | 1971-01-07 | Asahi Kasei Kogyo K K . Osaka (Ja pan) | Trägermaterial fur photopolymensier bares Material und dessen Verwendung zur Herstellung von Rehefdruckplatten |
FR2168577A1 (fr) * | 1972-01-19 | 1973-08-31 | Basf Ag | |
US4060656A (en) * | 1973-04-02 | 1977-11-29 | Teijin Limited | Support for photosensitive resin |
FR2357930A1 (fr) * | 1976-03-10 | 1978-02-03 | Philips Nv | Element photosensible et methode pour la realisation d'un porteur d'information presentant une densite d'information elevee |
-
1979
- 1979-04-24 FR FR7910342A patent/FR2455305A1/fr active Granted
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3178378A (en) * | 1960-05-31 | 1965-04-13 | Gen Aniline & Film Corp | Subbing layer for hydrophobic, dimensionally stable, inert-surfaced photographic filmbase |
DE1572303A1 (de) * | 1967-04-11 | 1970-01-08 | Basf Ag | Verfahren zum Aufbringen lichtempfindlicher Schichten aus Polyamiden auf metallische Unterlagen |
DE2031476A1 (de) * | 1969-06-25 | 1971-01-07 | Asahi Kasei Kogyo K K . Osaka (Ja pan) | Trägermaterial fur photopolymensier bares Material und dessen Verwendung zur Herstellung von Rehefdruckplatten |
FR2168577A1 (fr) * | 1972-01-19 | 1973-08-31 | Basf Ag | |
US4060656A (en) * | 1973-04-02 | 1977-11-29 | Teijin Limited | Support for photosensitive resin |
FR2357930A1 (fr) * | 1976-03-10 | 1978-02-03 | Philips Nv | Element photosensible et methode pour la realisation d'un porteur d'information presentant une densite d'information elevee |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0242143A2 (fr) * | 1986-04-11 | 1987-10-21 | Toray Industries, Inc. | Plaque pour l'impression |
EP0242143A3 (en) * | 1986-04-11 | 1987-11-25 | Toray Industries, Inc. | Printing plate |
Also Published As
Publication number | Publication date |
---|---|
FR2455305B1 (fr) | 1982-06-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |