JPS56153741A - Supporting device for semiconductor wafer - Google Patents
Supporting device for semiconductor waferInfo
- Publication number
- JPS56153741A JPS56153741A JP5750580A JP5750580A JPS56153741A JP S56153741 A JPS56153741 A JP S56153741A JP 5750580 A JP5750580 A JP 5750580A JP 5750580 A JP5750580 A JP 5750580A JP S56153741 A JPS56153741 A JP S56153741A
- Authority
- JP
- Japan
- Prior art keywords
- metal plate
- wafer
- air permeable
- section
- permeable metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000002184 metal Substances 0.000 abstract 7
- 238000000034 method Methods 0.000 abstract 2
- 239000000428 dust Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000005498 polishing Methods 0.000 abstract 1
- 238000007789 sealing Methods 0.000 abstract 1
- 239000003566 sealing material Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3046—Mechanical treatment, e.g. grinding, polishing, cutting using blasting, e.g. sand-blasting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Jigs For Machine Tools (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5750580A JPS56153741A (en) | 1980-04-30 | 1980-04-30 | Supporting device for semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5750580A JPS56153741A (en) | 1980-04-30 | 1980-04-30 | Supporting device for semiconductor wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56153741A true JPS56153741A (en) | 1981-11-27 |
JPS6245696B2 JPS6245696B2 (enrdf_load_stackoverflow) | 1987-09-28 |
Family
ID=13057581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5750580A Granted JPS56153741A (en) | 1980-04-30 | 1980-04-30 | Supporting device for semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56153741A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58180026A (ja) * | 1982-04-15 | 1983-10-21 | Nippon Telegr & Teleph Corp <Ntt> | ウエハ研磨用吸着板 |
JPH11309638A (ja) * | 1998-04-28 | 1999-11-09 | Kyocera Corp | 真空吸着盤 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5756207A (en) * | 1980-09-22 | 1982-04-03 | Teikoku Hiyuumukan Kk | Manufacture of concrete pipe containing steel fiber |
-
1980
- 1980-04-30 JP JP5750580A patent/JPS56153741A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5756207A (en) * | 1980-09-22 | 1982-04-03 | Teikoku Hiyuumukan Kk | Manufacture of concrete pipe containing steel fiber |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58180026A (ja) * | 1982-04-15 | 1983-10-21 | Nippon Telegr & Teleph Corp <Ntt> | ウエハ研磨用吸着板 |
JPH11309638A (ja) * | 1998-04-28 | 1999-11-09 | Kyocera Corp | 真空吸着盤 |
Also Published As
Publication number | Publication date |
---|---|
JPS6245696B2 (enrdf_load_stackoverflow) | 1987-09-28 |
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