JPS5614970B2 - - Google Patents

Info

Publication number
JPS5614970B2
JPS5614970B2 JP1346574A JP1346574A JPS5614970B2 JP S5614970 B2 JPS5614970 B2 JP S5614970B2 JP 1346574 A JP1346574 A JP 1346574A JP 1346574 A JP1346574 A JP 1346574A JP S5614970 B2 JPS5614970 B2 JP S5614970B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1346574A
Other languages
Japanese (ja)
Other versions
JPS50108002A (enrdf_load_html_response
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1346574A priority Critical patent/JPS5614970B2/ja
Priority to GB442075A priority patent/GB1492620A/en
Publication of JPS50108002A publication Critical patent/JPS50108002A/ja
Priority to US05/765,036 priority patent/US4196003A/en
Publication of JPS5614970B2 publication Critical patent/JPS5614970B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP1346574A 1974-02-01 1974-02-01 Expired JPS5614970B2 (enrdf_load_html_response)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1346574A JPS5614970B2 (enrdf_load_html_response) 1974-02-01 1974-02-01
GB442075A GB1492620A (en) 1974-02-01 1975-01-31 Ortho-quinonediazide light-sensitive copying material
US05/765,036 US4196003A (en) 1974-02-01 1977-02-02 Light-sensitive o-quinone diazide copying composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1346574A JPS5614970B2 (enrdf_load_html_response) 1974-02-01 1974-02-01

Publications (2)

Publication Number Publication Date
JPS50108002A JPS50108002A (enrdf_load_html_response) 1975-08-26
JPS5614970B2 true JPS5614970B2 (enrdf_load_html_response) 1981-04-07

Family

ID=11833882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1346574A Expired JPS5614970B2 (enrdf_load_html_response) 1974-02-01 1974-02-01

Country Status (2)

Country Link
JP (1) JPS5614970B2 (enrdf_load_html_response)
GB (1) GB1492620A (enrdf_load_html_response)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1120763A (en) * 1977-11-23 1982-03-30 James A. Carothers Enhancement of resist development
JPS5498244A (en) * 1978-01-20 1979-08-03 Toray Industries Method of forming positive photo resist image
JPS5532088A (en) * 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photo mask forming method
JPS5590943A (en) * 1978-12-28 1980-07-10 Fuji Photo Film Co Ltd Photosensitive material and image forming method applicable thereto
JPS5636648A (en) * 1979-09-03 1981-04-09 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
GB2171530B (en) * 1985-02-27 1989-06-28 Imtec Products Inc Method of producing reversed photoresist images by vapour diffusion
CA1281578C (en) * 1985-07-18 1991-03-19 Susan A. Ferguson High contrast photoresist developer with enhanced sensitivity
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
JP2555589B2 (ja) * 1987-03-26 1996-11-20 日本合成ゴム株式会社 集積回路作製用ポジ型感放射線性樹脂組成物
JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method
DE3738603A1 (de) * 1987-11-13 1989-05-24 Merck Patent Gmbh Lagerstabile positiv-fotoresist-zusammensetzungen
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray
DE4013575C2 (de) * 1990-04-27 1994-08-11 Basf Ag Verfahren zur Herstellung negativer Reliefkopien
DE4107390A1 (de) * 1991-03-08 1992-09-10 Hoechst Ag Gefaerbtes, positiv arbeitendes, lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung sowohl positiver als auch negativer farbpruefbilder unter verwendung dieses materials

Also Published As

Publication number Publication date
JPS50108002A (enrdf_load_html_response) 1975-08-26
GB1492620A (en) 1977-11-23

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