JPS56147076A - Characteristic testing electrode - Google Patents
Characteristic testing electrodeInfo
- Publication number
- JPS56147076A JPS56147076A JP5038280A JP5038280A JPS56147076A JP S56147076 A JPS56147076 A JP S56147076A JP 5038280 A JP5038280 A JP 5038280A JP 5038280 A JP5038280 A JP 5038280A JP S56147076 A JPS56147076 A JP S56147076A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- subject
- slight
- tested
- assured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Abstract
PURPOSE:To realize a compact electrode and ensure an assured measurement test, by tilting slight a bar-type testing electrode to the electrode of the subject to be tested when the electrodes touch each other so that the electrode shifts with a slight touch on the face of the electrode. CONSTITUTION:The insulating support block 6 which goes up and down by the cam mechanism 5 is attached to the post 4 set upright on the stage 3 onto which the subject to be tested or the electrode 2 of the test subject is set. The bar-type testing electrode 1 is attached to the block 6 with a slight inclination to the stage 3. With such characteristic electrode, the tip of the electrode 1 shifts slightly on the electrode 2 when touching the electrode 2. Thus the surface of the electrode 2 is scratched to remove the stains or oxide on the surface of electrode. As a result, an assured and accurate measurement test is made possible. Furthermore the electrode 1 is tilted slightly to the up-down direction to save the space and thus to obtain a compact electrode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5038280A JPS56147076A (en) | 1980-04-18 | 1980-04-18 | Characteristic testing electrode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5038280A JPS56147076A (en) | 1980-04-18 | 1980-04-18 | Characteristic testing electrode |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56147076A true JPS56147076A (en) | 1981-11-14 |
Family
ID=12857314
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5038280A Pending JPS56147076A (en) | 1980-04-18 | 1980-04-18 | Characteristic testing electrode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56147076A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61100138U (en) * | 1984-12-05 | 1986-06-26 | ||
JPS63138728A (en) * | 1986-11-29 | 1988-06-10 | Toshiba Corp | Appratus for forming electrode |
JPH05326655A (en) * | 1992-07-22 | 1993-12-10 | Tokyo Electron Ltd | Measuring method of semiconductor wafer |
JPH07307367A (en) * | 1994-05-09 | 1995-11-21 | Tokyo Electron Ltd | Wafer prober and measurement of semiconductor wafer |
-
1980
- 1980-04-18 JP JP5038280A patent/JPS56147076A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61100138U (en) * | 1984-12-05 | 1986-06-26 | ||
JPH0331077Y2 (en) * | 1984-12-05 | 1991-07-01 | ||
JPS63138728A (en) * | 1986-11-29 | 1988-06-10 | Toshiba Corp | Appratus for forming electrode |
JPH05326655A (en) * | 1992-07-22 | 1993-12-10 | Tokyo Electron Ltd | Measuring method of semiconductor wafer |
JPH07307367A (en) * | 1994-05-09 | 1995-11-21 | Tokyo Electron Ltd | Wafer prober and measurement of semiconductor wafer |
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