JPS5613377B2 - - Google Patents

Info

Publication number
JPS5613377B2
JPS5613377B2 JP12462076A JP12462076A JPS5613377B2 JP S5613377 B2 JPS5613377 B2 JP S5613377B2 JP 12462076 A JP12462076 A JP 12462076A JP 12462076 A JP12462076 A JP 12462076A JP S5613377 B2 JPS5613377 B2 JP S5613377B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12462076A
Other languages
Japanese (ja)
Other versions
JPS5349955A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12462076A priority Critical patent/JPS5349955A/ja
Priority to DE19772746519 priority patent/DE2746519A1/de
Publication of JPS5349955A publication Critical patent/JPS5349955A/ja
Publication of JPS5613377B2 publication Critical patent/JPS5613377B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12462076A 1976-10-18 1976-10-18 Spin coating method Granted JPS5349955A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP12462076A JPS5349955A (en) 1976-10-18 1976-10-18 Spin coating method
DE19772746519 DE2746519A1 (de) 1976-10-18 1977-10-17 Drehbeschichtungsverfahren

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12462076A JPS5349955A (en) 1976-10-18 1976-10-18 Spin coating method

Publications (2)

Publication Number Publication Date
JPS5349955A JPS5349955A (en) 1978-05-06
JPS5613377B2 true JPS5613377B2 (cs) 1981-03-27

Family

ID=14889914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12462076A Granted JPS5349955A (en) 1976-10-18 1976-10-18 Spin coating method

Country Status (2)

Country Link
JP (1) JPS5349955A (cs)
DE (1) DE2746519A1 (cs)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57192955A (en) * 1981-05-25 1982-11-27 Toppan Printing Co Ltd Developing method
US4564280A (en) * 1982-10-28 1986-01-14 Fujitsu Limited Method and apparatus for developing resist film including a movable nozzle arm
JPS6242766A (ja) * 1985-08-14 1987-02-24 Kyodo Printing Co Ltd 被膜の形成方法
JPH07284715A (ja) * 1994-04-15 1995-10-31 Dainippon Screen Mfg Co Ltd 処理液塗布装置及び処理液塗布方法
JPH08213308A (ja) * 1994-11-29 1996-08-20 Tokyo Ohka Kogyo Co Ltd 塗布方法
DE10351963B4 (de) * 2003-11-07 2013-08-22 Süss Microtec Lithography Gmbh Verfahren zum Belacken von Halbleitersubstraten
JP4588506B2 (ja) * 2005-03-25 2010-12-01 大日本印刷株式会社 塗布液の塗布装置および塗布方法
JP2007055846A (ja) * 2005-08-24 2007-03-08 Tokyo Electron Ltd ＡＢＯｘ型ペロブスカイト結晶構造を有する誘電体膜の形成方法
DE102020005723A1 (de) 2020-09-18 2022-03-24 Westsächsische Hochschule Zwickau Verfahren zum Beschichten dreidimensionaler Substrate mit photostrukturierbaren Resisten

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5536183B2 (cs) * 1973-10-15 1980-09-19

Also Published As

Publication number Publication date
JPS5349955A (en) 1978-05-06
DE2746519A1 (de) 1978-04-20

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