JPS5612860B2 - - Google Patents

Info

Publication number
JPS5612860B2
JPS5612860B2 JP10008272A JP10008272A JPS5612860B2 JP S5612860 B2 JPS5612860 B2 JP S5612860B2 JP 10008272 A JP10008272 A JP 10008272A JP 10008272 A JP10008272 A JP 10008272A JP S5612860 B2 JPS5612860 B2 JP S5612860B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10008272A
Other languages
Japanese (ja)
Other versions
JPS4957903A (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10008272A priority Critical patent/JPS5612860B2/ja
Priority to GB4649073A priority patent/GB1442374A/en
Priority to DE19732350211 priority patent/DE2350211A1/de
Publication of JPS4957903A publication Critical patent/JPS4957903A/ja
Publication of JPS5612860B2 publication Critical patent/JPS5612860B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP10008272A 1972-10-05 1972-10-05 Expired JPS5612860B2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP10008272A JPS5612860B2 (fr) 1972-10-05 1972-10-05
GB4649073A GB1442374A (en) 1972-10-05 1973-10-04 Method of making presensitized dry planographic printing plate precursors
DE19732350211 DE2350211A1 (de) 1972-10-05 1973-10-05 Verfahren zur herstellung einer vorsensibilisierten trockenen flachdruckplatte

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10008272A JPS5612860B2 (fr) 1972-10-05 1972-10-05

Publications (2)

Publication Number Publication Date
JPS4957903A JPS4957903A (fr) 1974-06-05
JPS5612860B2 true JPS5612860B2 (fr) 1981-03-25

Family

ID=14264505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10008272A Expired JPS5612860B2 (fr) 1972-10-05 1972-10-05

Country Status (3)

Country Link
JP (1) JPS5612860B2 (fr)
DE (1) DE2350211A1 (fr)
GB (1) GB1442374A (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1499024A (en) * 1974-05-30 1978-01-25 Xerox Corp Process for making printing masters
GB2034911B (en) * 1978-10-26 1983-02-09 Toray Industries Dry planographic printing plate
JPS55110249A (en) * 1979-02-19 1980-08-25 Toray Ind Inc Lithographic printing plate requiring no wetting water
JPS5680046A (en) * 1979-12-05 1981-07-01 Toray Ind Inc Lithographic plate requiring no dampening water and its manufacture
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法
DE3545204A1 (de) * 1985-12-20 1987-06-25 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
DE3628719A1 (de) * 1986-08-23 1988-02-25 Hoechst Ag Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck
DE3731438A1 (de) * 1987-09-18 1989-03-30 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen flachdruck
DE3738863A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
JP2520686B2 (ja) * 1988-03-18 1996-07-31 富士写真フイルム株式会社 湿し水不要感光性平版印刷板
DE19515804A1 (de) * 1995-05-04 1996-11-07 Hoechst Ag Mit Wasser entschichtbares Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten
JPH09239943A (ja) * 1996-03-08 1997-09-16 Fuji Photo Film Co Ltd 湿し水不要平版原版

Also Published As

Publication number Publication date
DE2350211A1 (de) 1974-04-18
GB1442374A (en) 1976-07-14
JPS4957903A (fr) 1974-06-05

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