JPS5612744A - Wafer prober - Google Patents
Wafer proberInfo
- Publication number
- JPS5612744A JPS5612744A JP8856979A JP8856979A JPS5612744A JP S5612744 A JPS5612744 A JP S5612744A JP 8856979 A JP8856979 A JP 8856979A JP 8856979 A JP8856979 A JP 8856979A JP S5612744 A JPS5612744 A JP S5612744A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- stylus
- prober
- polishing
- probe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Abstract
PURPOSE:To rationalize the process eliminating poor contact or the like in the probing process by arranging a polishing (washing) means within the maximum movement range of a wafer chuck top and at a part excluding the wafer placing surface. CONSTITUTION:A polishing base 3 (or washing section) made of a ceramic plate or the like having a rough surface at a part excluding the surface for placing the wafer 2 on a wafer chuck top 1. A probe stylus 6 mounted on a probe card 4 is moved pressing against the polishing base whereby an aluminum oxide, dirt or marking ink attached to the tip of the probe stylus tip is removed. Thus, it is possible to fully deliver the function of automatic wafer prober without stopping of the probing action due to poor contact of the prober stylus.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8856979A JPS5612744A (en) | 1979-07-12 | 1979-07-12 | Wafer prober |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8856979A JPS5612744A (en) | 1979-07-12 | 1979-07-12 | Wafer prober |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5612744A true JPS5612744A (en) | 1981-02-07 |
JPS5759668B2 JPS5759668B2 (en) | 1982-12-15 |
Family
ID=13946488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8856979A Granted JPS5612744A (en) | 1979-07-12 | 1979-07-12 | Wafer prober |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5612744A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4751458A (en) * | 1984-04-02 | 1988-06-14 | American Telephone And Telegraph Company, At&T Bell Laboratories | Test pads for integrated circuit chips |
JPS64742A (en) * | 1987-03-24 | 1989-01-05 | Tokyo Electron Ltd | Probing device |
US6024629A (en) * | 1997-01-22 | 2000-02-15 | Tokyo Electron Limited | Probe apparatus and a method for polishing a probe |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6183969U (en) * | 1984-11-06 | 1986-06-03 |
-
1979
- 1979-07-12 JP JP8856979A patent/JPS5612744A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4751458A (en) * | 1984-04-02 | 1988-06-14 | American Telephone And Telegraph Company, At&T Bell Laboratories | Test pads for integrated circuit chips |
JPS64742A (en) * | 1987-03-24 | 1989-01-05 | Tokyo Electron Ltd | Probing device |
US6024629A (en) * | 1997-01-22 | 2000-02-15 | Tokyo Electron Limited | Probe apparatus and a method for polishing a probe |
Also Published As
Publication number | Publication date |
---|---|
JPS5759668B2 (en) | 1982-12-15 |
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