JPS56126924A - Forming device for picture - Google Patents

Forming device for picture

Info

Publication number
JPS56126924A
JPS56126924A JP3048680A JP3048680A JPS56126924A JP S56126924 A JPS56126924 A JP S56126924A JP 3048680 A JP3048680 A JP 3048680A JP 3048680 A JP3048680 A JP 3048680A JP S56126924 A JPS56126924 A JP S56126924A
Authority
JP
Japan
Prior art keywords
shaft
circular arc
void
mirrors
picture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3048680A
Other languages
Japanese (ja)
Inventor
Yoshio Yazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OAK SEISAKUSHO KK
OKU SEISAKUSHO CO Ltd
Original Assignee
OAK SEISAKUSHO KK
OKU SEISAKUSHO CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OAK SEISAKUSHO KK, OKU SEISAKUSHO CO Ltd filed Critical OAK SEISAKUSHO KK
Priority to JP3048680A priority Critical patent/JPS56126924A/en
Publication of JPS56126924A publication Critical patent/JPS56126924A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements

Abstract

PURPOSE:To obtain an accurate picture by a slight number of mirrors by a method wherein two concave mirrors, shafts thereof are in common, are arranged oppositely, and a light source and voids are disposed according to a fixed method at a location where a radius of a circle cut by a plane, which passes through a focus and is vertical to the shaft, is formed and is in parallel with the shaft. CONSTITUTION:Concave mirrors 1, 2 are oppositely disposed making a shaft Z in common. Circular arcs B, C, axes thereof are symmetrical, are made up on a circle A by cutting by a plane 3, which is vertical to the shaft Z and passes through a focus F1. A mercury lamp 4 is mounted where parallel with the shaft Z and opposite to the circular arc B, the surface of the circular arc B is lit through a circular void 5, and a void 6, a shape thereof is the same as the void 5 and a curved surface thereof is opposed, is arranged corresponding to the circular arc C. A mask pattern 7 is disposed between the void 6 and the concave mirror 2 and a wafer 8 at a symmetrical location of the mask 7 and the shaft Z. When an interval l3 between a circular arc F of the concave mirror 2 and the mask 7 and an interval l4 between a circular arc G and the wafer 8 are equalized, a picture of the mask pattern 7 is made up on the wafer accurately at equal magnification. According to this constitution, the number of mirrors may be four maximally, and can be decreased as compared to conventional devices, and the accurate picture can be obtained.
JP3048680A 1980-03-11 1980-03-11 Forming device for picture Pending JPS56126924A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3048680A JPS56126924A (en) 1980-03-11 1980-03-11 Forming device for picture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3048680A JPS56126924A (en) 1980-03-11 1980-03-11 Forming device for picture

Publications (1)

Publication Number Publication Date
JPS56126924A true JPS56126924A (en) 1981-10-05

Family

ID=12305158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3048680A Pending JPS56126924A (en) 1980-03-11 1980-03-11 Forming device for picture

Country Status (1)

Country Link
JP (1) JPS56126924A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61204935A (en) * 1985-03-07 1986-09-11 Seiko Epson Corp Exposure equipment for reflection-reduction projection

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61204935A (en) * 1985-03-07 1986-09-11 Seiko Epson Corp Exposure equipment for reflection-reduction projection

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