JPS56121256A - Ion source device - Google Patents

Ion source device

Info

Publication number
JPS56121256A
JPS56121256A JP2442180A JP2442180A JPS56121256A JP S56121256 A JPS56121256 A JP S56121256A JP 2442180 A JP2442180 A JP 2442180A JP 2442180 A JP2442180 A JP 2442180A JP S56121256 A JPS56121256 A JP S56121256A
Authority
JP
Japan
Prior art keywords
discharge chamber
gas
vacuum
starting
vacuum pump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2442180A
Other languages
Japanese (ja)
Inventor
Satoru Sukenobu
Shigeki Kadoma
Setsuo Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2442180A priority Critical patent/JPS56121256A/en
Publication of JPS56121256A publication Critical patent/JPS56121256A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details

Abstract

PURPOSE:To flow a less amount of gas into a vacuum line and decrease load applied to a vacuum pump, by applying the separation between an electric discharge chamber and the vacuum line with a partitioning mechanism at the time of discharge starting when gas pressure is high in the discharge chamber. CONSTITUTION:Between an electric discharge chamber 2 and vacuum vessel 22, a selectively open-close controllable shutter 21 is provided, while the first vacuum pump 20 for evacuating the inside of the discharge chamber 2 is separately provided. At the time of starting when more quantity of gas must be introduced into the discharge chamber 2, the shutter 21 is closed to lower the pressure of gas in the discharge chamber 2 to about 10<-1>-10<-2> Pa and then opened after starting, thus quantity of gas flowing into the vacuum vessel 22 is decreased. Accordingly a load applied to a vacuum pump 23 can be decreased.
JP2442180A 1980-02-28 1980-02-28 Ion source device Pending JPS56121256A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2442180A JPS56121256A (en) 1980-02-28 1980-02-28 Ion source device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2442180A JPS56121256A (en) 1980-02-28 1980-02-28 Ion source device

Publications (1)

Publication Number Publication Date
JPS56121256A true JPS56121256A (en) 1981-09-24

Family

ID=12137684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2442180A Pending JPS56121256A (en) 1980-02-28 1980-02-28 Ion source device

Country Status (1)

Country Link
JP (1) JPS56121256A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014515540A (en) * 2011-05-20 2014-06-30 パーデュー・リサーチ・ファウンデーション System and method for analyzing a sample

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014515540A (en) * 2011-05-20 2014-06-30 パーデュー・リサーチ・ファウンデーション System and method for analyzing a sample
US9129786B2 (en) 2011-05-20 2015-09-08 Purdue Research Foundation Systems and methods for analyzing a sample

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