JPS56119776A - Method and apparatus for removing copper from copper chloride etching solution and regenerating said solution by electrolysis - Google Patents

Method and apparatus for removing copper from copper chloride etching solution and regenerating said solution by electrolysis

Info

Publication number
JPS56119776A
JPS56119776A JP1749081A JP1749081A JPS56119776A JP S56119776 A JPS56119776 A JP S56119776A JP 1749081 A JP1749081 A JP 1749081A JP 1749081 A JP1749081 A JP 1749081A JP S56119776 A JPS56119776 A JP S56119776A
Authority
JP
Japan
Prior art keywords
cathode
copper
metallic copper
current density
soln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1749081A
Other languages
Japanese (ja)
Other versions
JPS5729560B2 (en
Inventor
Yoshio Nakano
Saburo Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KAGAKU GIJUTSU SHINKOUKAI
DIC Corp
Original Assignee
KAGAKU GIJUTSU SHINKOUKAI
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KAGAKU GIJUTSU SHINKOUKAI, Dainippon Ink and Chemicals Co Ltd filed Critical KAGAKU GIJUTSU SHINKOUKAI
Priority to JP1749081A priority Critical patent/JPS56119776A/en
Publication of JPS56119776A publication Critical patent/JPS56119776A/en
Publication of JPS5729560B2 publication Critical patent/JPS5729560B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

PURPOSE:To easily separate and recover metallic copper from the surface of a cathode, when a waste copper chloride etching soln. is regenerated by an electrolytic method and metallic copper is deposited on the cathode, by adjusting the area and current density of the cathode to a specified range. CONSTITUTION:The etching power of a CuCl2 etching soln. used in a process of etching copper of a printed substrate or the like is reduced owing to an increase in the CuCl content as the soln. is used. So, the soln. is electrolyzed to deposit metallic copper on a cathode as well as chlorinate CuCl to CuCl2. At this time, the current density of the cathode is adjuted to 20-150A/cm<2>, and the area of the cathode is reduced to a half or less of that of an anode. By controlling the increase of the anode current density to a half or less of that of the cathode current density, polarization is inhibited to prevent the CuCl2 regeneration efficiency from lowering, and metallic copper is deposited on the cathode in the form of fine grains to easily separate and recover metallic copper from the cathode surface.
JP1749081A 1981-02-10 1981-02-10 Method and apparatus for removing copper from copper chloride etching solution and regenerating said solution by electrolysis Granted JPS56119776A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1749081A JPS56119776A (en) 1981-02-10 1981-02-10 Method and apparatus for removing copper from copper chloride etching solution and regenerating said solution by electrolysis

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1749081A JPS56119776A (en) 1981-02-10 1981-02-10 Method and apparatus for removing copper from copper chloride etching solution and regenerating said solution by electrolysis

Publications (2)

Publication Number Publication Date
JPS56119776A true JPS56119776A (en) 1981-09-19
JPS5729560B2 JPS5729560B2 (en) 1982-06-23

Family

ID=11945439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1749081A Granted JPS56119776A (en) 1981-02-10 1981-02-10 Method and apparatus for removing copper from copper chloride etching solution and regenerating said solution by electrolysis

Country Status (1)

Country Link
JP (1) JPS56119776A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007186769A (en) * 2006-01-16 2007-07-26 Nikko Kinzoku Kk Method for producing electrodeposited copper sheet
JP2014520956A (en) * 2011-07-08 2014-08-25 インスティテュート・オブ・ケミカル・テクノロジー Effect of operating parameters on the performance of electrochemical cells in the copper-chlorine cycle
JP2014522912A (en) * 2011-07-08 2014-09-08 インスティテュート・オブ・ケミカル・テクノロジー Electrochemical cell used in hydrogen production using CU-Cl thermochemical cycle

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007186769A (en) * 2006-01-16 2007-07-26 Nikko Kinzoku Kk Method for producing electrodeposited copper sheet
JP2014520956A (en) * 2011-07-08 2014-08-25 インスティテュート・オブ・ケミカル・テクノロジー Effect of operating parameters on the performance of electrochemical cells in the copper-chlorine cycle
JP2014522912A (en) * 2011-07-08 2014-09-08 インスティテュート・オブ・ケミカル・テクノロジー Electrochemical cell used in hydrogen production using CU-Cl thermochemical cycle
US9487876B2 (en) 2011-07-08 2016-11-08 Institute Of Chemical Technology Effect of operating parameters on the performance of electrochemical cell in copper-chlorine cycle

Also Published As

Publication number Publication date
JPS5729560B2 (en) 1982-06-23

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