JPS56118465A - Thin film-forming coating liquid composition and its coating method - Google Patents
Thin film-forming coating liquid composition and its coating methodInfo
- Publication number
- JPS56118465A JPS56118465A JP2173380A JP2173380A JPS56118465A JP S56118465 A JPS56118465 A JP S56118465A JP 2173380 A JP2173380 A JP 2173380A JP 2173380 A JP2173380 A JP 2173380A JP S56118465 A JPS56118465 A JP S56118465A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- liquid composition
- coating liquid
- forming coating
- ladder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title abstract 4
- 239000011248 coating agent Substances 0.000 title abstract 3
- 239000007788 liquid Substances 0.000 title abstract 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- SHRDVLUJLDYXSO-UHFFFAOYSA-N 2-phenoxyoxane Chemical compound O1CCCCC1OC1=CC=CC=C1 SHRDVLUJLDYXSO-UHFFFAOYSA-N 0.000 abstract 1
- PBCTYXBHPFCNBB-UHFFFAOYSA-N 2-phenoxyoxolane Chemical compound C1CCOC1OC1=CC=CC=C1 PBCTYXBHPFCNBB-UHFFFAOYSA-N 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 239000004973 liquid crystal related substance Substances 0.000 abstract 1
- KBXJHRABGYYAFC-UHFFFAOYSA-N octaphenylsilsesquioxane Chemical class O1[Si](O2)(C=3C=CC=CC=3)O[Si](O3)(C=4C=CC=CC=4)O[Si](O4)(C=5C=CC=CC=5)O[Si]1(C=1C=CC=CC=1)O[Si](O1)(C=5C=CC=CC=5)O[Si]2(C=2C=CC=CC=2)O[Si]3(C=2C=CC=CC=2)O[Si]41C1=CC=CC=C1 KBXJHRABGYYAFC-UHFFFAOYSA-N 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2173380A JPS56118465A (en) | 1980-02-25 | 1980-02-25 | Thin film-forming coating liquid composition and its coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2173380A JPS56118465A (en) | 1980-02-25 | 1980-02-25 | Thin film-forming coating liquid composition and its coating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56118465A true JPS56118465A (en) | 1981-09-17 |
| JPS6217629B2 JPS6217629B2 (Direct) | 1987-04-18 |
Family
ID=12063269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2173380A Granted JPS56118465A (en) | 1980-02-25 | 1980-02-25 | Thin film-forming coating liquid composition and its coating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56118465A (Direct) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140138655A1 (en) * | 2012-11-16 | 2014-05-22 | Seiko Epson Corporation | Ink for forming functional layer, ink container, discharging apparatus, method for forming functional layer, method for manufacturing organic el element, light emitting device, and electronic apparatus |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
-
1980
- 1980-02-25 JP JP2173380A patent/JPS56118465A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US20140138655A1 (en) * | 2012-11-16 | 2014-05-22 | Seiko Epson Corporation | Ink for forming functional layer, ink container, discharging apparatus, method for forming functional layer, method for manufacturing organic el element, light emitting device, and electronic apparatus |
| US10184056B2 (en) * | 2012-11-16 | 2019-01-22 | Seiko Epson Corporation | Ink for forming functional layer, ink container, discharghing apparatus, method for forming functional layer, method for manufacturing organic EL element, light emitting device, and electronic apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6217629B2 (Direct) | 1987-04-18 |
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