JPS56118465A - Thin film-forming coating liquid composition and its coating method - Google Patents

Thin film-forming coating liquid composition and its coating method

Info

Publication number
JPS56118465A
JPS56118465A JP2173380A JP2173380A JPS56118465A JP S56118465 A JPS56118465 A JP S56118465A JP 2173380 A JP2173380 A JP 2173380A JP 2173380 A JP2173380 A JP 2173380A JP S56118465 A JPS56118465 A JP S56118465A
Authority
JP
Japan
Prior art keywords
thin film
liquid composition
coating liquid
forming coating
ladder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2173380A
Other languages
Japanese (ja)
Other versions
JPS6217629B2 (en
Inventor
Fusaji Shoji
Mitsuo Nakatani
Takeshi Watanabe
Kazufumi Azuma
Ryoichi Sudo
Ataru Yokono
Tokio Isogai
Tonobu Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2173380A priority Critical patent/JPS56118465A/en
Publication of JPS56118465A publication Critical patent/JPS56118465A/en
Publication of JPS6217629B2 publication Critical patent/JPS6217629B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To obtain a thin film-forming coating liquid composition which is excellent in workability, safety, wholesomeness, and uniform thin film-forming capability by dissolving a ladder-type organosilicone polymer with a specific viscosity in a specific solvent.
CONSTITUTION: A thin film-forming coating liquid composition which is obtained by dissolving a ladder-type organosilicone polymer with phenyl groups, having an intrinsic viscosity of 1.1W3.0 (1% benzene solution at 30°C), e.g., polyphenylsilsesquioxane, poly (methyl-substituted phenylsilsesquioxane), poly (naphthylsilsesquioxane), etc. in a solvent whose main component is composed of compounds of formulas I and II (where R is an aromatic group, cycloalkane ring, or heterocyclic ring and n is 3W5), e.g., 2-phenoxytetrahydropyran, 2-phenoxytetrahydrofuran, etc. The composition is applicable in the formation of oriented film for liquid crystal display device, heat-resistance and insulating film for electronic parts, etc., by spinner method or printing method.
COPYRIGHT: (C)1981,JPO&Japio
JP2173380A 1980-02-25 1980-02-25 Thin film-forming coating liquid composition and its coating method Granted JPS56118465A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2173380A JPS56118465A (en) 1980-02-25 1980-02-25 Thin film-forming coating liquid composition and its coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2173380A JPS56118465A (en) 1980-02-25 1980-02-25 Thin film-forming coating liquid composition and its coating method

Publications (2)

Publication Number Publication Date
JPS56118465A true JPS56118465A (en) 1981-09-17
JPS6217629B2 JPS6217629B2 (en) 1987-04-18

Family

ID=12063269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2173380A Granted JPS56118465A (en) 1980-02-25 1980-02-25 Thin film-forming coating liquid composition and its coating method

Country Status (1)

Country Link
JP (1) JPS56118465A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140138655A1 (en) * 2012-11-16 2014-05-22 Seiko Epson Corporation Ink for forming functional layer, ink container, discharging apparatus, method for forming functional layer, method for manufacturing organic el element, light emitting device, and electronic apparatus
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US20140138655A1 (en) * 2012-11-16 2014-05-22 Seiko Epson Corporation Ink for forming functional layer, ink container, discharging apparatus, method for forming functional layer, method for manufacturing organic el element, light emitting device, and electronic apparatus
US10184056B2 (en) * 2012-11-16 2019-01-22 Seiko Epson Corporation Ink for forming functional layer, ink container, discharghing apparatus, method for forming functional layer, method for manufacturing organic EL element, light emitting device, and electronic apparatus

Also Published As

Publication number Publication date
JPS6217629B2 (en) 1987-04-18

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