JPS56116035A - Washing method of photomask - Google Patents

Washing method of photomask

Info

Publication number
JPS56116035A
JPS56116035A JP1886480A JP1886480A JPS56116035A JP S56116035 A JPS56116035 A JP S56116035A JP 1886480 A JP1886480 A JP 1886480A JP 1886480 A JP1886480 A JP 1886480A JP S56116035 A JPS56116035 A JP S56116035A
Authority
JP
Japan
Prior art keywords
washing
water
photomask
soluble gas
water soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1886480A
Other languages
Japanese (ja)
Inventor
Yoshimare Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1886480A priority Critical patent/JPS56116035A/en
Publication of JPS56116035A publication Critical patent/JPS56116035A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Abstract

PURPOSE:To decrease the pattern film separation during washing and prolong the service life of a photomask by washing the photomask with the washing water dissolved with a water soluble gas. CONSTITUTION:Washing water such as pure water is injected by an injection nozzle 2 from above into a tank in which a water soluble gas atmosphere such as gaseous CO2 is created, whereby the water soluble gas is dissolved in the washing water. This water is pressurized with a pump 3 and is supplied to an injection nozzle 4 through which it is injected under high pressure to the surface of a photomask 6 such as chromium plate held freely rotatively in a washing tank 5. Thereby, the electrostatic charge generated at the washing is neutralized by the water soluble gas ions, and the effective washing freee from pattern peeling and resticking of fine particles of dust is accomplished.
JP1886480A 1980-02-18 1980-02-18 Washing method of photomask Pending JPS56116035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1886480A JPS56116035A (en) 1980-02-18 1980-02-18 Washing method of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1886480A JPS56116035A (en) 1980-02-18 1980-02-18 Washing method of photomask

Publications (1)

Publication Number Publication Date
JPS56116035A true JPS56116035A (en) 1981-09-11

Family

ID=11983397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1886480A Pending JPS56116035A (en) 1980-02-18 1980-02-18 Washing method of photomask

Country Status (1)

Country Link
JP (1) JPS56116035A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020029206A (en) * 2000-10-12 2002-04-18 윤종용 Cleanable particle pellicle detector box

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56115538A (en) * 1980-02-19 1981-09-10 Toshiba Corp Treating method for semiconductor patterning wafer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56115538A (en) * 1980-02-19 1981-09-10 Toshiba Corp Treating method for semiconductor patterning wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020029206A (en) * 2000-10-12 2002-04-18 윤종용 Cleanable particle pellicle detector box

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