JPS56115905A - Measuring method for thickness of transparent film and device therefor - Google Patents

Measuring method for thickness of transparent film and device therefor

Info

Publication number
JPS56115905A
JPS56115905A JP2004080A JP2004080A JPS56115905A JP S56115905 A JPS56115905 A JP S56115905A JP 2004080 A JP2004080 A JP 2004080A JP 2004080 A JP2004080 A JP 2004080A JP S56115905 A JPS56115905 A JP S56115905A
Authority
JP
Japan
Prior art keywords
film
light
beams
thickness
reflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004080A
Other languages
English (en)
Inventor
Takashi Tagawa
Masaru Kashima
Akira Tsuchida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Priority to JP2004080A priority Critical patent/JPS56115905A/ja
Publication of JPS56115905A publication Critical patent/JPS56115905A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0691—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of objects while moving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2004080A 1980-02-19 1980-02-19 Measuring method for thickness of transparent film and device therefor Pending JPS56115905A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004080A JPS56115905A (en) 1980-02-19 1980-02-19 Measuring method for thickness of transparent film and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004080A JPS56115905A (en) 1980-02-19 1980-02-19 Measuring method for thickness of transparent film and device therefor

Publications (1)

Publication Number Publication Date
JPS56115905A true JPS56115905A (en) 1981-09-11

Family

ID=12015940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004080A Pending JPS56115905A (en) 1980-02-19 1980-02-19 Measuring method for thickness of transparent film and device therefor

Country Status (1)

Country Link
JP (1) JPS56115905A (ja)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5881126A (ja) * 1981-11-09 1983-05-16 Unitika Ltd 厚み精度の良いフイルムの製造方法
JPS6176904A (ja) * 1984-09-21 1986-04-19 Oak Seisakusho:Kk 膜厚測定方法
JPS6176905A (ja) * 1984-09-21 1986-04-19 Oak Seisakusho:Kk 膜厚測定の方法
JPS6224102A (ja) * 1985-07-24 1987-02-02 Nec Corp 半導体製造装置
JPH03110405A (ja) * 1989-09-25 1991-05-10 Japan Spectroscopic Co 多層薄膜評価装置
JPH03237304A (ja) * 1990-02-14 1991-10-23 Anelva Corp 薄膜作製装置
JP2006208196A (ja) * 2005-01-28 2006-08-10 Dainippon Printing Co Ltd 被膜検査装置および方法
JP2015530598A (ja) * 2012-10-04 2015-10-15 ザイゴ コーポレーションＺｙｇｏ Ｃｏｒｐｏｒａｔｉｏｎ 雑音を低減した位置監視システム
CN106840000A (zh) * 2017-01-07 2017-06-13 中国计量大学 一种分数阶傅立叶变换的白光反射测量膜厚的方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5881126A (ja) * 1981-11-09 1983-05-16 Unitika Ltd 厚み精度の良いフイルムの製造方法
JPS6176904A (ja) * 1984-09-21 1986-04-19 Oak Seisakusho:Kk 膜厚測定方法
JPS6176905A (ja) * 1984-09-21 1986-04-19 Oak Seisakusho:Kk 膜厚測定の方法
JPS6224102A (ja) * 1985-07-24 1987-02-02 Nec Corp 半導体製造装置
JPH03110405A (ja) * 1989-09-25 1991-05-10 Japan Spectroscopic Co 多層薄膜評価装置
JPH03237304A (ja) * 1990-02-14 1991-10-23 Anelva Corp 薄膜作製装置
JP2006208196A (ja) * 2005-01-28 2006-08-10 Dainippon Printing Co Ltd 被膜検査装置および方法
JP2015530598A (ja) * 2012-10-04 2015-10-15 ザイゴ コーポレーションＺｙｇｏ Ｃｏｒｐｏｒａｔｉｏｎ 雑音を低減した位置監視システム
CN106840000A (zh) * 2017-01-07 2017-06-13 中国计量大学 一种分数阶傅立叶变换的白光反射测量膜厚的方法
CN106840000B (zh) * 2017-01-07 2019-01-01 中国计量大学 一种分数阶傅立叶变换的白光反射测量膜厚的方法

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