JPS56104438A - X-ray lithographic device - Google Patents

X-ray lithographic device

Info

Publication number
JPS56104438A
JPS56104438A JP637780A JP637780A JPS56104438A JP S56104438 A JPS56104438 A JP S56104438A JP 637780 A JP637780 A JP 637780A JP 637780 A JP637780 A JP 637780A JP S56104438 A JPS56104438 A JP S56104438A
Authority
JP
Japan
Prior art keywords
ray
exposed
unit
irradiated
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP637780A
Other languages
Japanese (ja)
Other versions
JPS6037616B2 (en
Inventor
Yoshitaka Maeda
Tsuneyuki Kazama
Kyoichi Suwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIGAKU DENKI KK
Nikon Corp
Nippon Chemical Industrial Co Ltd
Rigaku Denki Co Ltd
Original Assignee
RIGAKU DENKI KK
Nippon Chemical Industrial Co Ltd
Rigaku Denki Co Ltd
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIGAKU DENKI KK, Nippon Chemical Industrial Co Ltd, Rigaku Denki Co Ltd, Nippon Kogaku KK filed Critical RIGAKU DENKI KK
Priority to JP55006377A priority Critical patent/JPS6037616B2/en
Publication of JPS56104438A publication Critical patent/JPS56104438A/en
Publication of JPS6037616B2 publication Critical patent/JPS6037616B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To equalize the incident X-ray amount to the units to be exposed in the X-ray lithographic device by irradiating an electron beam to an X-ray tube target to provide approximately a point X-ray source, introducing the X-rays to the unit to be exposed at a right angle, and providing an X-ray shielding plate for moving the front surface of the unit to be exposed. CONSTITUTION:An electron beam (e) is irradiated from an electron gun 50 to be incident to the surface 6 to be irradiated of the target inclined at 45-60 deg. with respect to the electron beam (e). The approximately point shaped X-ray source P is formed thereat, and soft X-ray (x) is conically irradiated through an X-ray window 7 to the unit 8 to be exposed such as a silicon wafer or the like. At this time the X- ray shielding plate 10 driven in a direction as designated by an arrow (y) by a drive unit 9 is provided at the front surface of the unit 8 to be exposed at the outside the window 7. After the X-ray (x) is irradiated and exposed for 7 minutes as an example, the plate is moved in the direction designated by (y) to gradually shield it and completely shields after 10min. Thus, uniform X-ray intensity distribution can be obtained to uniformly expose the unit to be exposed. This can be utilized to machine the semiconductor IC.
JP55006377A 1980-01-24 1980-01-24 X-ray lithography equipment Expired JPS6037616B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55006377A JPS6037616B2 (en) 1980-01-24 1980-01-24 X-ray lithography equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55006377A JPS6037616B2 (en) 1980-01-24 1980-01-24 X-ray lithography equipment

Publications (2)

Publication Number Publication Date
JPS56104438A true JPS56104438A (en) 1981-08-20
JPS6037616B2 JPS6037616B2 (en) 1985-08-27

Family

ID=11636680

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55006377A Expired JPS6037616B2 (en) 1980-01-24 1980-01-24 X-ray lithography equipment

Country Status (1)

Country Link
JP (1) JPS6037616B2 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0136672A2 (en) * 1983-09-30 1985-04-10 Hitachi, Ltd. Method and apparatus for X-ray exposure
EP0357425A2 (en) 1988-09-02 1990-03-07 Canon Kabushiki Kaisha An exposure apparatus
EP0359370A2 (en) * 1988-09-14 1990-03-21 Canon Kabushiki Kaisha Exposure control in X-ray exposure apparatus
EP0416811A2 (en) * 1989-09-07 1991-03-13 Canon Kabushiki Kaisha X-ray exposure method and apparatus
EP0421746A2 (en) * 1989-10-03 1991-04-10 Canon Kabushiki Kaisha Exposure apparatus
US5048988A (en) * 1985-01-07 1991-09-17 Canon Kabushiki Kaisha Ink sheet drive system for a recording device
US5172402A (en) * 1990-03-09 1992-12-15 Canon Kabushiki Kaisha Exposure apparatus
JPH04135394U (en) * 1991-01-23 1992-12-16 林建設工業株式会社 Blackboard for construction record photography
US5285488A (en) * 1989-09-21 1994-02-08 Canon Kabushiki Kaisha Exposure apparatus
US5365561A (en) * 1988-03-25 1994-11-15 Canon Kabushiki Kaisha Exposure control in an X-ray exposure apparatus

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0136672A2 (en) * 1983-09-30 1985-04-10 Hitachi, Ltd. Method and apparatus for X-ray exposure
US5048988A (en) * 1985-01-07 1991-09-17 Canon Kabushiki Kaisha Ink sheet drive system for a recording device
US5087136A (en) * 1985-01-07 1992-02-11 Canon Kabushiki Kaisha Printing mechanism with a cam and groove arrangement
US5365561A (en) * 1988-03-25 1994-11-15 Canon Kabushiki Kaisha Exposure control in an X-ray exposure apparatus
EP0357425A2 (en) 1988-09-02 1990-03-07 Canon Kabushiki Kaisha An exposure apparatus
EP0694817A3 (en) * 1988-09-02 1996-04-10 Canon Kk An exposure apparatus
EP0694817A2 (en) * 1988-09-02 1996-01-31 Canon Kabushiki Kaisha An exposure apparatus
EP0359370A2 (en) * 1988-09-14 1990-03-21 Canon Kabushiki Kaisha Exposure control in X-ray exposure apparatus
EP0416811A2 (en) * 1989-09-07 1991-03-13 Canon Kabushiki Kaisha X-ray exposure method and apparatus
US5285488A (en) * 1989-09-21 1994-02-08 Canon Kabushiki Kaisha Exposure apparatus
EP0421746A2 (en) * 1989-10-03 1991-04-10 Canon Kabushiki Kaisha Exposure apparatus
US5377251A (en) * 1990-03-09 1994-12-27 Canon Kabushiki Kaisha Exposure apparatus
US5172402A (en) * 1990-03-09 1992-12-15 Canon Kabushiki Kaisha Exposure apparatus
JPH04135394U (en) * 1991-01-23 1992-12-16 林建設工業株式会社 Blackboard for construction record photography
JP2587274Y2 (en) * 1991-01-23 1998-12-16 林建設工業株式会社 Stand-alone leg members for blackboards for recording construction records

Also Published As

Publication number Publication date
JPS6037616B2 (en) 1985-08-27

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