JPS5599049A - Defect detector - Google Patents

Defect detector

Info

Publication number
JPS5599049A
JPS5599049A JP612079A JP612079A JPS5599049A JP S5599049 A JPS5599049 A JP S5599049A JP 612079 A JP612079 A JP 612079A JP 612079 A JP612079 A JP 612079A JP S5599049 A JPS5599049 A JP S5599049A
Authority
JP
Japan
Prior art keywords
test piece
light
defects
cut
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP612079A
Other languages
Japanese (ja)
Inventor
Teruo Murakami
Kiyoshi Yamada
Masakata Minami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP612079A priority Critical patent/JPS5599049A/en
Priority to US06/109,217 priority patent/US4330205A/en
Priority to GB8000586A priority patent/GB2044921B/en
Publication of JPS5599049A publication Critical patent/JPS5599049A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination

Abstract

PURPOSE:To permit a quick detection of fine particles, flaws or the like on a plane object by detecting only scattered light due to defects with the normally reflected light with an optical planar scanning on the surface to be checked. CONSTITUTION:Laser beam magnified to a proper size with a collimater 101 is scanned in a planar way with a X-Y scanner 102. The beam is irradiated vertically on the test piece 105 with a lens 103 and a mirror 104 thereby allowing an even and quick scanning at a specified spot diameter. Then, the light 111 normally reflected from the test piece is collected on a space filter 108 with a condenser 107 to cut off. In this case, the scattered light 112 due to defects 110 on the test piece 105 won't be cut off thoroughly by the filter because of larger angle of scattering, and detected with a light detector 109.
JP612079A 1979-01-12 1979-01-24 Defect detector Pending JPS5599049A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP612079A JPS5599049A (en) 1979-01-24 1979-01-24 Defect detector
US06/109,217 US4330205A (en) 1979-01-12 1980-01-03 Optical apparatus for measuring the size and location of optical in an article
GB8000586A GB2044921B (en) 1979-01-12 1980-01-08 Optical apparatus for inspecting defects

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP612079A JPS5599049A (en) 1979-01-24 1979-01-24 Defect detector

Publications (1)

Publication Number Publication Date
JPS5599049A true JPS5599049A (en) 1980-07-28

Family

ID=11629639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP612079A Pending JPS5599049A (en) 1979-01-12 1979-01-24 Defect detector

Country Status (1)

Country Link
JP (1) JPS5599049A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5960344A (en) * 1982-09-04 1984-04-06 ロ−ベルト・ボツシユ・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング Method and device for automatically inspecting surface by coherent laser luminous flux
JPS61104244A (en) * 1984-10-29 1986-05-22 Hitachi Ltd Apparatus for detecting foreign matter of semiconductive wafer
JPS61296243A (en) * 1985-06-24 1986-12-27 Datsuku Eng Kk Method for inspecting object to be inspected in non-contact state
JPS6211138A (en) * 1985-06-28 1987-01-20 Hitachi Electronics Eng Co Ltd Apparatus for inspecting foreign matter
JP2009008658A (en) * 2007-04-12 2009-01-15 Imra America Inc Beam scanning imaging apparatus
US7754998B2 (en) * 2004-05-26 2010-07-13 Yamazaki Mazak Corporation Focus adjuster for laser beam machine

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5960344A (en) * 1982-09-04 1984-04-06 ロ−ベルト・ボツシユ・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング Method and device for automatically inspecting surface by coherent laser luminous flux
JPS61104244A (en) * 1984-10-29 1986-05-22 Hitachi Ltd Apparatus for detecting foreign matter of semiconductive wafer
JPS61296243A (en) * 1985-06-24 1986-12-27 Datsuku Eng Kk Method for inspecting object to be inspected in non-contact state
JPS6211138A (en) * 1985-06-28 1987-01-20 Hitachi Electronics Eng Co Ltd Apparatus for inspecting foreign matter
JPH0514857B2 (en) * 1985-06-28 1993-02-26 Hitachi Electr Eng
US7754998B2 (en) * 2004-05-26 2010-07-13 Yamazaki Mazak Corporation Focus adjuster for laser beam machine
JP2009008658A (en) * 2007-04-12 2009-01-15 Imra America Inc Beam scanning imaging apparatus

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