JPS5591189A - Semiconductor laser diode and method of fabricating same - Google Patents

Semiconductor laser diode and method of fabricating same

Info

Publication number
JPS5591189A
JPS5591189A JP17403979A JP17403979A JPS5591189A JP S5591189 A JPS5591189 A JP S5591189A JP 17403979 A JP17403979 A JP 17403979A JP 17403979 A JP17403979 A JP 17403979A JP S5591189 A JPS5591189 A JP S5591189A
Authority
JP
Japan
Prior art keywords
semiconductor laser
laser diode
fabricating same
fabricating
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17403979A
Other languages
English (en)
Inventor
Aman Marukusukurisuchian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of JPS5591189A publication Critical patent/JPS5591189A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40—Materials therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005—Processes
    • H01L33/0062—Processes for devices with an active region comprising only III-V compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26—Materials of the light emitting region
    • H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Geometry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Weting (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP17403979A 1978-12-28 1979-12-27 Semiconductor laser diode and method of fabricating same Pending JPS5591189A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782856507 DE2856507A1 (de) 1978-12-28 1978-12-28 Halbleiter-laserdiode

Publications (1)

Publication Number Publication Date
JPS5591189A true JPS5591189A (en) 1980-07-10

Family

ID=6058590

Family Applications (2)

Application Number Title Priority Date Filing Date
JP17403979A Pending JPS5591189A (en) 1978-12-28 1979-12-27 Semiconductor laser diode and method of fabricating same
JP1985116344U Pending JPS6144866U (ja) 1978-12-28 1985-07-29 半導体レ−ザ−・ダイオ−ド

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP1985116344U Pending JPS6144866U (ja) 1978-12-28 1985-07-29 半導体レ−ザ−・ダイオ−ド

Country Status (5)

Country Link
US (1) US4352187A (ja)
JP (2) JPS5591189A (ja)
DE (1) DE2856507A1 (ja)
FR (1) FR2445638B1 (ja)
GB (1) GB2038538B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5967684A (ja) * 1982-09-16 1984-04-17 シ−メンス・アクチエンゲゼルシヤフト レ−ザ−・ダイオ−ド

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2488049A1 (fr) * 1980-07-31 1982-02-05 Bouley Jean Source lumineuse a jonction semiconductrice, notamment source-laser, utilisant des diodes schottky, et procede de fabrication
JPS5833885A (ja) * 1981-08-24 1983-02-28 Hitachi Ltd レ−ザ−ダイオ−ド
DE3332398A1 (de) * 1983-09-08 1985-03-28 Standard Elektrik Lorenz Ag, 7000 Stuttgart Multimodenlaser
USRE34378E (en) * 1984-03-16 1993-09-14 Hitachi, Ltd. Light emitting device with improved electrode structure to minimize short circuiting
GB2156585B (en) * 1984-03-16 1987-10-21 Hitachi Ltd Light-emitting device electrode
US4615032A (en) * 1984-07-13 1986-09-30 At&T Bell Laboratories Self-aligned rib-waveguide high power laser
DE3437209A1 (de) * 1984-10-10 1986-04-17 Siemens AG, 1000 Berlin und 8000 München Verbesserung zu einem monomoden-diodenlaser
DE3531734A1 (de) * 1985-09-05 1987-03-12 Siemens Ag Einrichtung zur positionierung eines halbleiterlasers mit selbstjustierender wirkung fuer eine anzukoppelnde glasfaser
DE3534744A1 (de) * 1985-09-28 1987-04-09 Standard Elektrik Lorenz Ag Laservorrichtung mit stabilisierter ausgangsleistung
EP0236713A3 (de) * 1986-02-10 1988-06-29 Siemens Aktiengesellschaft Laserdiode
EP0237812A3 (de) * 1986-03-20 1988-06-29 Siemens Aktiengesellschaft Halbleiterlaser-Array mit gebündelter Abstrahlung
DE3612695A1 (de) * 1986-04-15 1987-10-22 Siemens Ag Halbleiter-laserdiode mit qualitativ verbesserter resonator-spiegelflaeche
FR2606223B1 (fr) * 1986-10-29 1996-03-01 Seiko Epson Corp Laser a semiconducteur et son procede de fabrication
JPS63306689A (ja) * 1987-05-22 1988-12-14 シーメンス、アクチエンゲゼルシヤフト 横結合レーザーダイオードアレー
JPH0231487A (ja) * 1988-07-20 1990-02-01 Mitsubishi Electric Corp 半導体レーザ装置とその製造方法
EP0383958B1 (de) * 1989-02-15 1993-06-02 Siemens Aktiengesellschaft Abstimmbarer Halbleiterlaser
NL8900748A (nl) * 1989-03-28 1990-10-16 Philips Nv Straling-emitterende halfgeleiderinrichting en werkwijze ter vervaardiging van een dergelijke halfgeleiderinrichting.
US6859277B2 (en) * 2002-08-27 2005-02-22 Particle Measuring Systems, Inc. Particle counter with strip laser diode
DE102004052857B4 (de) * 2004-10-26 2006-09-07 Forschungsverbund Berlin E.V. Optisches Element und Verfahren zu dessen Herstellung
DE102015116865A1 (de) 2015-10-05 2017-04-06 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines Halbleiterchips und Halbleiterchip

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5071281A (ja) * 1973-10-26 1975-06-13
JPS5286093A (en) * 1976-01-12 1977-07-16 Hitachi Ltd Striped semiconductor laser
US4206468A (en) * 1976-05-11 1980-06-03 Thomson-Csf Contacting structure on a semiconductor arrangement
FR2351504A1 (fr) * 1976-05-11 1977-12-09 Thomson Csf Nouveau dispositif de prise de contact sur un ensemble semi-conducteur
US4099305A (en) * 1977-03-14 1978-07-11 Bell Telephone Laboratories, Incorporated Fabrication of mesa devices by MBE growth over channeled substrates
US4169997A (en) * 1977-05-06 1979-10-02 Bell Telephone Laboratories, Incorporated Lateral current confinement in junction lasers
JPH0571281A (ja) * 1991-09-12 1993-03-23 Naka Ind Ltd 避難用梯子

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5967684A (ja) * 1982-09-16 1984-04-17 シ−メンス・アクチエンゲゼルシヤフト レ−ザ−・ダイオ−ド

Also Published As

Publication number Publication date
US4352187A (en) 1982-09-28
FR2445638B1 (fr) 1986-02-21
FR2445638A1 (fr) 1980-07-25
GB2038538B (en) 1983-02-16
JPS6144866U (ja) 1986-03-25
GB2038538A (en) 1980-07-23
DE2856507A1 (de) 1980-07-17
DE2856507C2 (ja) 1989-03-30

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