JPS5589842A - Retouching method for plate face of waterless lithographic printing plate - Google Patents
Retouching method for plate face of waterless lithographic printing plateInfo
- Publication number
- JPS5589842A JPS5589842A JP16126178A JP16126178A JPS5589842A JP S5589842 A JPS5589842 A JP S5589842A JP 16126178 A JP16126178 A JP 16126178A JP 16126178 A JP16126178 A JP 16126178A JP S5589842 A JPS5589842 A JP S5589842A
- Authority
- JP
- Japan
- Prior art keywords
- plate face
- plate
- coated
- lithographic printing
- silicone rubber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002379 silicone rubber Polymers 0.000 abstract 3
- 239000004945 silicone rubber Substances 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 230000002950 deficient Effects 0.000 abstract 2
- 229920001296 polysiloxane Polymers 0.000 abstract 2
- 230000002940 repellent Effects 0.000 abstract 2
- 239000005871 repellent Substances 0.000 abstract 2
- 229910000077 silane Inorganic materials 0.000 abstract 2
- -1 silane compound Chemical class 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 abstract 1
- 125000001302 tertiary amino group Chemical group 0.000 abstract 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16126178A JPS5589842A (en) | 1978-12-28 | 1978-12-28 | Retouching method for plate face of waterless lithographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16126178A JPS5589842A (en) | 1978-12-28 | 1978-12-28 | Retouching method for plate face of waterless lithographic printing plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5589842A true JPS5589842A (en) | 1980-07-07 |
| JPS6154217B2 JPS6154217B2 (enrdf_load_stackoverflow) | 1986-11-21 |
Family
ID=15731727
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16126178A Granted JPS5589842A (en) | 1978-12-28 | 1978-12-28 | Retouching method for plate face of waterless lithographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5589842A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5855932A (ja) * | 1981-09-30 | 1983-04-02 | Toray Ind Inc | 湿し水不要平版印刷版の後処理方法 |
| JPS5882247A (ja) * | 1981-11-11 | 1983-05-17 | Toray Ind Inc | 湿し水不要平版印刷版原板 |
| JPS62299854A (ja) * | 1986-06-18 | 1987-12-26 | Fuji Photo Film Co Ltd | 湿し水不要平版印刷版用版面修正液 |
| JPH028854A (ja) * | 1988-06-28 | 1990-01-12 | Konica Corp | 湿し水不要平版印刷版用版面修正液 |
| JPH06110201A (ja) * | 1992-09-28 | 1994-04-22 | Fuji Photo Film Co Ltd | 水なし平版印刷版の版面修正方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6864570B2 (en) | 1993-12-17 | 2005-03-08 | The Regents Of The University Of California | Method and apparatus for fabricating self-assembling microstructures |
-
1978
- 1978-12-28 JP JP16126178A patent/JPS5589842A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5855932A (ja) * | 1981-09-30 | 1983-04-02 | Toray Ind Inc | 湿し水不要平版印刷版の後処理方法 |
| JPS5882247A (ja) * | 1981-11-11 | 1983-05-17 | Toray Ind Inc | 湿し水不要平版印刷版原板 |
| JPS62299854A (ja) * | 1986-06-18 | 1987-12-26 | Fuji Photo Film Co Ltd | 湿し水不要平版印刷版用版面修正液 |
| JPH028854A (ja) * | 1988-06-28 | 1990-01-12 | Konica Corp | 湿し水不要平版印刷版用版面修正液 |
| JPH06110201A (ja) * | 1992-09-28 | 1994-04-22 | Fuji Photo Film Co Ltd | 水なし平版印刷版の版面修正方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6154217B2 (enrdf_load_stackoverflow) | 1986-11-21 |
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