JPS5582441A - Device for aligning mask - Google Patents
Device for aligning maskInfo
- Publication number
- JPS5582441A JPS5582441A JP15598378A JP15598378A JPS5582441A JP S5582441 A JPS5582441 A JP S5582441A JP 15598378 A JP15598378 A JP 15598378A JP 15598378 A JP15598378 A JP 15598378A JP S5582441 A JPS5582441 A JP S5582441A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- wafer
- motors
- piezoelectric
- relative position
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To perform alignment with high accuracy in an automatic mask aligning device, by causing a computer to process a signal showing the relative position of a mask and a wafer and control motors for moving the wafer or the mask depending on their relative position.
CONSTITUTION: The position of a target on a wafer and that of another target on a mask are detected by photoelectric converters or the like. A mask aligner 61 supplies a necessary signal to a computer 64 to perform calculation. The result of the calculation is applied to a piezoelectric inching mechanism to drive piezoelectric minute- step motors 681, 682, 683 for variables x, y, θ through the motor controllers 671, 672, 673 of the inching mechanism to displace the wafer or the mask. The relative position of the mask and the wafer is detected to rapidly drive the piezoelectric motors toward an objective position. When the motors have passed through the objective position, they are slowly reversed to set the water or the maks in the objective position. The mask is thus aligned with high accuracy.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15598378A JPS5582441A (en) | 1978-12-14 | 1978-12-14 | Device for aligning mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15598378A JPS5582441A (en) | 1978-12-14 | 1978-12-14 | Device for aligning mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5582441A true JPS5582441A (en) | 1980-06-21 |
Family
ID=15617780
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15598378A Pending JPS5582441A (en) | 1978-12-14 | 1978-12-14 | Device for aligning mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5582441A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120079690A1 (en) * | 2010-09-30 | 2012-04-05 | Daishi Arimatsu | Method of piezoelectric vibrating piece, wafer, piezoelectric vibrator, oscillator, electronic apparatus, and radio-controlled timepiece |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5117031A (en) * | 1974-08-03 | 1976-02-10 | Hitachi Ltd | TEIRYURYO SOCHI |
-
1978
- 1978-12-14 JP JP15598378A patent/JPS5582441A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5117031A (en) * | 1974-08-03 | 1976-02-10 | Hitachi Ltd | TEIRYURYO SOCHI |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120079690A1 (en) * | 2010-09-30 | 2012-04-05 | Daishi Arimatsu | Method of piezoelectric vibrating piece, wafer, piezoelectric vibrator, oscillator, electronic apparatus, and radio-controlled timepiece |
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