JPS5576066A - Manufacture of target porcelain for high frequency sputtering - Google Patents

Manufacture of target porcelain for high frequency sputtering

Info

Publication number
JPS5576066A
JPS5576066A JP14870678A JP14870678A JPS5576066A JP S5576066 A JPS5576066 A JP S5576066A JP 14870678 A JP14870678 A JP 14870678A JP 14870678 A JP14870678 A JP 14870678A JP S5576066 A JPS5576066 A JP S5576066A
Authority
JP
Japan
Prior art keywords
temp
calcined
target
manufacture
porcelain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14870678A
Other languages
Japanese (ja)
Other versions
JPS5744744B2 (en
Inventor
Takuoki Hata
Takashi Iguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14870678A priority Critical patent/JPS5576066A/en
Publication of JPS5576066A publication Critical patent/JPS5576066A/en
Publication of JPS5744744B2 publication Critical patent/JPS5744744B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To manufacture the product described in the title for film piezoelectric crystal excellent in axial orientation and in film surface uniformity, by subjecting ZnO powder to calcination, pulverization, static press. formation, then by grinding it into a shape having spherical or hemispherical surface, and by calcining and solidifying it at a specific temp. CONSTITUTION:ZnO powder is calcined at a temp. 700-1,200 deg.C, and pulverized, dried, and granulated by addn. with a binder. Then the granulated material is subjected to static press. forming, and is ground and formed into a shape having hollow spherical or hemispherical surface (e.g., a segment of a sphere of a radius r), it is then calcined and solidified at a temp. 750-1,400 deg.C for about two hrs. The target porcelain manufactured by this method is high in resistivity of the target body and shows a small internal loss of energy during sputtering because the target porcelain is calcined at a low temp.
JP14870678A 1978-11-30 1978-11-30 Manufacture of target porcelain for high frequency sputtering Granted JPS5576066A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14870678A JPS5576066A (en) 1978-11-30 1978-11-30 Manufacture of target porcelain for high frequency sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14870678A JPS5576066A (en) 1978-11-30 1978-11-30 Manufacture of target porcelain for high frequency sputtering

Publications (2)

Publication Number Publication Date
JPS5576066A true JPS5576066A (en) 1980-06-07
JPS5744744B2 JPS5744744B2 (en) 1982-09-22

Family

ID=15458766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14870678A Granted JPS5576066A (en) 1978-11-30 1978-11-30 Manufacture of target porcelain for high frequency sputtering

Country Status (1)

Country Link
JP (1) JPS5576066A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001040534A3 (en) * 1999-12-06 2001-11-15 Fraunhofer Ges Forschung Device and method for coating objects at a high temperature

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5818740U (en) * 1981-07-30 1983-02-04 富士通株式会社 Print head for dot printer
JPH0247017Y2 (en) * 1984-12-10 1990-12-11

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50119996A (en) * 1974-03-12 1975-09-19
JPS512683A (en) * 1974-06-25 1976-01-10 Nichiden Varian Kk Zetsuenbutsuno teionsupatsutasochi
JPS53141311A (en) * 1977-05-16 1978-12-09 Murata Manufacturing Co Zinc oxide base ceramics for high frequency spattering

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50119996A (en) * 1974-03-12 1975-09-19
JPS512683A (en) * 1974-06-25 1976-01-10 Nichiden Varian Kk Zetsuenbutsuno teionsupatsutasochi
JPS53141311A (en) * 1977-05-16 1978-12-09 Murata Manufacturing Co Zinc oxide base ceramics for high frequency spattering

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001040534A3 (en) * 1999-12-06 2001-11-15 Fraunhofer Ges Forschung Device and method for coating objects at a high temperature

Also Published As

Publication number Publication date
JPS5744744B2 (en) 1982-09-22

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