JPS555841B2 - - Google Patents

Info

Publication number
JPS555841B2
JPS555841B2 JP741927A JP192774A JPS555841B2 JP S555841 B2 JPS555841 B2 JP S555841B2 JP 741927 A JP741927 A JP 741927A JP 192774 A JP192774 A JP 192774A JP S555841 B2 JPS555841 B2 JP S555841B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP741927A
Other languages
Japanese (ja)
Other versions
JPS5096897A (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP741927A priority Critical patent/JPS555841B2/ja
Priority to GB5369974A priority patent/GB1429610A/en
Priority to DE19742461096 priority patent/DE2461096C3/de
Priority to FR7443130A priority patent/FR2256515B1/fr
Publication of JPS5096897A publication Critical patent/JPS5096897A/ja
Priority to US05/723,310 priority patent/US4042479A/en
Publication of JPS555841B2 publication Critical patent/JPS555841B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
  • Electronic Switches (AREA)
JP741927A 1973-12-27 1973-12-27 Expired JPS555841B2 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP741927A JPS555841B2 (fr) 1973-12-27 1973-12-27
GB5369974A GB1429610A (en) 1973-12-27 1974-12-12 Thin film resistor and a sputtering method of producing the same
DE19742461096 DE2461096C3 (de) 1973-12-27 1974-12-23 Verfahren zur Herstellung eines Dunnschichtwiderstandes
FR7443130A FR2256515B1 (fr) 1973-12-27 1974-12-27
US05/723,310 US4042479A (en) 1973-12-27 1976-09-14 Thin film resistor and a method of producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP741927A JPS555841B2 (fr) 1973-12-27 1973-12-27

Publications (2)

Publication Number Publication Date
JPS5096897A JPS5096897A (fr) 1975-08-01
JPS555841B2 true JPS555841B2 (fr) 1980-02-12

Family

ID=11515221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP741927A Expired JPS555841B2 (fr) 1973-12-27 1973-12-27

Country Status (4)

Country Link
JP (1) JPS555841B2 (fr)
DE (1) DE2461096C3 (fr)
FR (1) FR2256515B1 (fr)
GB (1) GB1429610A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2546675C3 (de) * 1975-10-17 1979-08-02 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen einer Dünnschichtschaltung
JPS53106496A (en) * 1977-02-28 1978-09-16 Fujitsu Ltd Exothermic element
AU742275B2 (en) * 1996-12-27 2001-12-20 Canon Kabushiki Kaisha Charge-reducing film, image forming apparatus and method of manufacturing the same
CN1127750C (zh) 1996-12-27 2003-11-12 佳能株式会社 减少电荷的薄膜,图象形成装置及其制造方法
JP4676780B2 (ja) * 2005-02-16 2011-04-27 株式会社神戸製鋼所 硬質皮膜、積層型硬質皮膜およびその製造方法
JP5179526B2 (ja) * 2010-02-03 2013-04-10 株式会社神戸製鋼所 硬質皮膜、積層型硬質皮膜およびその製造方法

Also Published As

Publication number Publication date
DE2461096B2 (de) 1977-07-21
JPS5096897A (fr) 1975-08-01
DE2461096A1 (de) 1975-07-03
FR2256515B1 (fr) 1977-10-28
GB1429610A (en) 1976-03-24
FR2256515A1 (fr) 1975-07-25
DE2461096C3 (de) 1978-04-06

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