GB1429610A - Thin film resistor and a sputtering method of producing the same - Google Patents
Thin film resistor and a sputtering method of producing the sameInfo
- Publication number
- GB1429610A GB1429610A GB5369974A GB5369974A GB1429610A GB 1429610 A GB1429610 A GB 1429610A GB 5369974 A GB5369974 A GB 5369974A GB 5369974 A GB5369974 A GB 5369974A GB 1429610 A GB1429610 A GB 1429610A
- Authority
- GB
- United Kingdom
- Prior art keywords
- producing
- thin film
- same
- sputtering method
- film resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Non-Adjustable Resistors (AREA)
- Electronic Switches (AREA)
Abstract
1429610 Sputtering nitride of Ta-Al FUJITSU Ltd 12 Dec 1974 [27 Dec 1973] 53699/74 Heading C7F A target of Ta-Al ( 30 to 80% Ta) is sputtered in an argon-nitrogen atmosphere to form a resistive film.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP741927A JPS555841B2 (en) | 1973-12-27 | 1973-12-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1429610A true GB1429610A (en) | 1976-03-24 |
Family
ID=11515221
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5369974A Expired GB1429610A (en) | 1973-12-27 | 1974-12-12 | Thin film resistor and a sputtering method of producing the same |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS555841B2 (en) |
DE (1) | DE2461096C3 (en) |
FR (1) | FR2256515B1 (en) |
GB (1) | GB1429610A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0851459A2 (en) * | 1996-12-27 | 1998-07-01 | Canon Kabushiki Kaisha | Charge-reducing film, image forming apparatus and method of manufacturing the same |
AU742275B2 (en) * | 1996-12-27 | 2001-12-20 | Canon Kabushiki Kaisha | Charge-reducing film, image forming apparatus and method of manufacturing the same |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2546675C3 (en) * | 1975-10-17 | 1979-08-02 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Method of manufacturing a thin-film circuit |
JPS53106496A (en) * | 1977-02-28 | 1978-09-16 | Fujitsu Ltd | Exothermic element |
JP4676780B2 (en) * | 2005-02-16 | 2011-04-27 | 株式会社神戸製鋼所 | Hard coating, laminated hard coating and method for producing the same |
JP5179526B2 (en) * | 2010-02-03 | 2013-04-10 | 株式会社神戸製鋼所 | Hard coating, laminated hard coating and method for producing the same |
-
1973
- 1973-12-27 JP JP741927A patent/JPS555841B2/ja not_active Expired
-
1974
- 1974-12-12 GB GB5369974A patent/GB1429610A/en not_active Expired
- 1974-12-23 DE DE19742461096 patent/DE2461096C3/en not_active Expired
- 1974-12-27 FR FR7443130A patent/FR2256515B1/fr not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0851459A2 (en) * | 1996-12-27 | 1998-07-01 | Canon Kabushiki Kaisha | Charge-reducing film, image forming apparatus and method of manufacturing the same |
EP0851459A3 (en) * | 1996-12-27 | 1998-08-26 | Canon Kabushiki Kaisha | Charge-reducing film, image forming apparatus and method of manufacturing the same |
AU742275B2 (en) * | 1996-12-27 | 2001-12-20 | Canon Kabushiki Kaisha | Charge-reducing film, image forming apparatus and method of manufacturing the same |
US6342754B1 (en) | 1996-12-27 | 2002-01-29 | Canon Kabushiki Kaisha | Charge-reducing film, image forming apparatus including said film and method of manufacturing said image forming apparatus |
Also Published As
Publication number | Publication date |
---|---|
DE2461096A1 (en) | 1975-07-03 |
JPS555841B2 (en) | 1980-02-12 |
DE2461096C3 (en) | 1978-04-06 |
FR2256515A1 (en) | 1975-07-25 |
DE2461096B2 (en) | 1977-07-21 |
FR2256515B1 (en) | 1977-10-28 |
JPS5096897A (en) | 1975-08-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PE20 | Patent expired after termination of 20 years |
Effective date: 19941211 |