JPS5553423A - Pattern forming - Google Patents
Pattern formingInfo
- Publication number
- JPS5553423A JPS5553423A JP12708678A JP12708678A JPS5553423A JP S5553423 A JPS5553423 A JP S5553423A JP 12708678 A JP12708678 A JP 12708678A JP 12708678 A JP12708678 A JP 12708678A JP S5553423 A JPS5553423 A JP S5553423A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- copolymer
- resolution characteristics
- methacrylic
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To obtain resists of excellent resolution characteristics, by heat treating a copolymer of methyl methacrylate and methacrylic and/or acrylic acid at a temperature below the principal chain cutting temperature and then dissolving it in a solvent.
CONSTITUTION: A copolymer of methyl mathacrylate, 90mol%, and methacrylic acid, 10mol%, is given heat treatment in N2 gas at 200°C for 15min. Next, this is dissolved in N, N-dimethylformamide. Further, as an auxiliary agent to avoid coating unevenness, 2-ethosyethylacetate is mixed with it by the same amount of formamide. Resist solution obtained in this way is coated on a semiconductor wafer and is left in N2 gas solution for 24 hours. After this, the substance is sintered preliminarily in N2 gas at 160°C for 50min. The result shows the lowering in the degree of dissolution required for forming a clear pattern. Consequently, the resultant resist has good resolution characteristics and permits easy application.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12708678A JPS5553423A (en) | 1978-10-16 | 1978-10-16 | Pattern forming |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12708678A JPS5553423A (en) | 1978-10-16 | 1978-10-16 | Pattern forming |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5553423A true JPS5553423A (en) | 1980-04-18 |
Family
ID=14951225
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12708678A Pending JPS5553423A (en) | 1978-10-16 | 1978-10-16 | Pattern forming |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5553423A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5376826A (en) * | 1976-12-20 | 1978-07-07 | Ibm | Method of forming regist image |
-
1978
- 1978-10-16 JP JP12708678A patent/JPS5553423A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5376826A (en) * | 1976-12-20 | 1978-07-07 | Ibm | Method of forming regist image |
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