JPS5547453B2 - - Google Patents
Info
- Publication number
- JPS5547453B2 JPS5547453B2 JP6427275A JP6427275A JPS5547453B2 JP S5547453 B2 JPS5547453 B2 JP S5547453B2 JP 6427275 A JP6427275 A JP 6427275A JP 6427275 A JP6427275 A JP 6427275A JP S5547453 B2 JPS5547453 B2 JP S5547453B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
- Projection-Type Copiers In General (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50064272A JPS51140488A (en) | 1975-05-30 | 1975-05-30 | Mask alignment device |
| US05/689,818 US4170418A (en) | 1975-05-30 | 1976-05-25 | Alignment apparatus |
| GB22131/76A GB1546194A (en) | 1975-05-30 | 1976-05-27 | Alignment apparatus |
| NL7605772A NL7605772A (nl) | 1975-05-30 | 1976-05-28 | Inrichting voor het centreren van twee op elkaar geplaatste voorwerpen. |
| DE2624062A DE2624062C3 (de) | 1975-05-30 | 1976-05-28 | Justiervorrichtung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50064272A JPS51140488A (en) | 1975-05-30 | 1975-05-30 | Mask alignment device |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5159680A Division JPS5629327A (en) | 1980-04-21 | 1980-04-21 | Apparatus for aligning wafer with mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51140488A JPS51140488A (en) | 1976-12-03 |
| JPS5547453B2 true JPS5547453B2 (enExample) | 1980-11-29 |
Family
ID=13253398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50064272A Granted JPS51140488A (en) | 1975-05-30 | 1975-05-30 | Mask alignment device |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4170418A (enExample) |
| JP (1) | JPS51140488A (enExample) |
| DE (1) | DE2624062C3 (enExample) |
| GB (1) | GB1546194A (enExample) |
| NL (1) | NL7605772A (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53111280A (en) * | 1977-03-10 | 1978-09-28 | Canon Inc | Mask or wafer for production of semiconductor elements and device for aligning these |
| DE2726173C2 (de) * | 1977-06-08 | 1982-05-27 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und Schaltung zur automatischen Positionierung eines Werkstückes relativ zu einem Abtastfeld bzw. zu einer Maske, sowie Verwendung des Verfahrens |
| JPS54114181A (en) * | 1978-02-27 | 1979-09-06 | Canon Inc | Alignment device |
| DE2846316A1 (de) * | 1978-10-24 | 1980-06-04 | Siemens Ag | Verfahren und vorrichtung zur automatischen ausrichtung von zwei aufeinander einzujustierenden objekten |
| DE2822269C2 (de) * | 1978-05-22 | 1983-12-01 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur automatischen Ausrichtung von zwei aufeinander einzujustierenden Objekten |
| EP0005462B1 (de) * | 1978-05-22 | 1983-06-08 | Siemens Aktiengesellschaft | Verfahren zum Positionieren von zwei aufeinander einzujustierenden Objekten |
| JPS5588347A (en) * | 1978-12-27 | 1980-07-04 | Fujitsu Ltd | Automatic aligning system |
| DE2917971A1 (de) * | 1979-05-04 | 1980-11-13 | Leitz Ernst Gmbh | Verfahren zur automatischen auswertung von eindruecken bei der haertepruefung von werkstoffen und einrichtung zur durchfuehrung des verfahrens |
| JPS5655041A (en) * | 1979-10-11 | 1981-05-15 | Nippon Telegr & Teleph Corp <Ntt> | Positioning exposure |
| JPS56110234A (en) * | 1980-02-06 | 1981-09-01 | Canon Inc | Projection printing device |
| US4362389A (en) * | 1980-02-19 | 1982-12-07 | Hitachi, Ltd. | Method and apparatus for projection type mask alignment |
| JPS5874038A (ja) * | 1981-10-28 | 1983-05-04 | Canon Inc | マスクとウエハ−の位置合せ方法 |
| JPS59172724A (ja) * | 1983-03-22 | 1984-09-29 | Canon Inc | マーク検出装置 |
| US4639604A (en) * | 1983-03-29 | 1987-01-27 | Nippon Kagaku K.K. | Method and apparatus for detecting an edge position of a pattern and eliminating overlapping pattern signals |
| GB2151350A (en) * | 1983-11-25 | 1985-07-17 | Vs Eng Ltd | Sensing arrangement |
| GB2158325B (en) * | 1984-04-27 | 1987-10-21 | Dainippon Screen Mfg | A method and apparatus for facilitating alignment of images |
| US4652914A (en) * | 1984-04-27 | 1987-03-24 | Dainippon Screen Mfg. Co., Ltd. | Method of recording register marks |
| EP0296192A1 (en) * | 1986-12-29 | 1988-12-28 | Hughes Aircraft Company | X-Y-$g(U)-Z POSITIONING STAGE |
| US4891526A (en) * | 1986-12-29 | 1990-01-02 | Hughes Aircraft Company | X-Y-θ-Z positioning stage |
| GB8727964D0 (en) * | 1987-11-30 | 1988-01-06 | Atomic Energy Authority Uk | Displacement monitoring with vibration/temperature fluctuation compensation |
| JP2880317B2 (ja) * | 1991-03-28 | 1999-04-05 | ウシオ電機株式会社 | フィルム露光方法 |
| US6038349A (en) * | 1995-09-13 | 2000-03-14 | Ricoh Company, Ltd. | Simultaneous registration of multiple image fragments |
| US5734594A (en) * | 1996-09-25 | 1998-03-31 | Chartered Semiconductor Manufacturing Pte Ltd. | Method and system for enhancement of wafer alignment accuracy |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3038369A (en) * | 1958-12-22 | 1962-06-12 | Bell Telephone Labor Inc | Positioning a transistor by use of the optical reflectance characteristics of the electrode stripes |
| US3955072A (en) * | 1971-03-22 | 1976-05-04 | Kasper Instruments, Inc. | Apparatus for the automatic alignment of two superimposed objects for example a semiconductor wafer and a transparent mask |
| JPS5148109B2 (enExample) * | 1972-06-21 | 1976-12-18 | ||
| JPS549900B2 (enExample) * | 1972-10-13 | 1979-04-28 | ||
| US3943359A (en) * | 1973-06-15 | 1976-03-09 | Hitachi, Ltd. | Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope |
-
1975
- 1975-05-30 JP JP50064272A patent/JPS51140488A/ja active Granted
-
1976
- 1976-05-25 US US05/689,818 patent/US4170418A/en not_active Expired - Lifetime
- 1976-05-27 GB GB22131/76A patent/GB1546194A/en not_active Expired
- 1976-05-28 DE DE2624062A patent/DE2624062C3/de not_active Expired
- 1976-05-28 NL NL7605772A patent/NL7605772A/xx not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| NL7605772A (nl) | 1976-12-02 |
| DE2624062C3 (de) | 1980-07-24 |
| DE2624062A1 (de) | 1976-12-16 |
| JPS51140488A (en) | 1976-12-03 |
| GB1546194A (en) | 1979-05-16 |
| US4170418A (en) | 1979-10-09 |
| DE2624062B2 (de) | 1979-11-08 |