JPS51140488A - Mask alignment device - Google Patents

Mask alignment device

Info

Publication number
JPS51140488A
JPS51140488A JP50064272A JP6427275A JPS51140488A JP S51140488 A JPS51140488 A JP S51140488A JP 50064272 A JP50064272 A JP 50064272A JP 6427275 A JP6427275 A JP 6427275A JP S51140488 A JPS51140488 A JP S51140488A
Authority
JP
Japan
Prior art keywords
alignment device
mask alignment
simplify
probability
reduce
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50064272A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5547453B2 (enExample
Inventor
Susumu Aiuchi
Minoru Ikeda
Yoshio Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50064272A priority Critical patent/JPS51140488A/ja
Priority to US05/689,818 priority patent/US4170418A/en
Priority to GB22131/76A priority patent/GB1546194A/en
Priority to NL7605772A priority patent/NL7605772A/xx
Priority to DE2624062A priority patent/DE2624062C3/de
Publication of JPS51140488A publication Critical patent/JPS51140488A/ja
Publication of JPS5547453B2 publication Critical patent/JPS5547453B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Projection-Type Copiers In General (AREA)
JP50064272A 1975-05-30 1975-05-30 Mask alignment device Granted JPS51140488A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP50064272A JPS51140488A (en) 1975-05-30 1975-05-30 Mask alignment device
US05/689,818 US4170418A (en) 1975-05-30 1976-05-25 Alignment apparatus
GB22131/76A GB1546194A (en) 1975-05-30 1976-05-27 Alignment apparatus
NL7605772A NL7605772A (nl) 1975-05-30 1976-05-28 Inrichting voor het centreren van twee op elkaar geplaatste voorwerpen.
DE2624062A DE2624062C3 (de) 1975-05-30 1976-05-28 Justiervorrichtung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50064272A JPS51140488A (en) 1975-05-30 1975-05-30 Mask alignment device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP5159680A Division JPS5629327A (en) 1980-04-21 1980-04-21 Apparatus for aligning wafer with mask

Publications (2)

Publication Number Publication Date
JPS51140488A true JPS51140488A (en) 1976-12-03
JPS5547453B2 JPS5547453B2 (enExample) 1980-11-29

Family

ID=13253398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50064272A Granted JPS51140488A (en) 1975-05-30 1975-05-30 Mask alignment device

Country Status (5)

Country Link
US (1) US4170418A (enExample)
JP (1) JPS51140488A (enExample)
DE (1) DE2624062C3 (enExample)
GB (1) GB1546194A (enExample)
NL (1) NL7605772A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53111280A (en) * 1977-03-10 1978-09-28 Canon Inc Mask or wafer for production of semiconductor elements and device for aligning these
JPS54114181A (en) * 1978-02-27 1979-09-06 Canon Inc Alignment device
JPS54152975A (en) * 1978-05-22 1979-12-01 Siemens Ag Method of and device for automatically coinciding
JPS5655041A (en) * 1979-10-11 1981-05-15 Nippon Telegr & Teleph Corp <Ntt> Positioning exposure
JPH04299332A (ja) * 1991-03-28 1992-10-22 Ushio Inc フィルム露光方法

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2726173C2 (de) * 1977-06-08 1982-05-27 Siemens AG, 1000 Berlin und 8000 München Verfahren und Schaltung zur automatischen Positionierung eines Werkstückes relativ zu einem Abtastfeld bzw. zu einer Maske, sowie Verwendung des Verfahrens
DE2846316A1 (de) * 1978-10-24 1980-06-04 Siemens Ag Verfahren und vorrichtung zur automatischen ausrichtung von zwei aufeinander einzujustierenden objekten
EP0005462B1 (de) * 1978-05-22 1983-06-08 Siemens Aktiengesellschaft Verfahren zum Positionieren von zwei aufeinander einzujustierenden Objekten
JPS5588347A (en) * 1978-12-27 1980-07-04 Fujitsu Ltd Automatic aligning system
DE2917971A1 (de) * 1979-05-04 1980-11-13 Leitz Ernst Gmbh Verfahren zur automatischen auswertung von eindruecken bei der haertepruefung von werkstoffen und einrichtung zur durchfuehrung des verfahrens
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
US4362389A (en) * 1980-02-19 1982-12-07 Hitachi, Ltd. Method and apparatus for projection type mask alignment
JPS5874038A (ja) * 1981-10-28 1983-05-04 Canon Inc マスクとウエハ−の位置合せ方法
JPS59172724A (ja) * 1983-03-22 1984-09-29 Canon Inc マーク検出装置
US4639604A (en) * 1983-03-29 1987-01-27 Nippon Kagaku K.K. Method and apparatus for detecting an edge position of a pattern and eliminating overlapping pattern signals
GB2151350A (en) * 1983-11-25 1985-07-17 Vs Eng Ltd Sensing arrangement
GB2158325B (en) * 1984-04-27 1987-10-21 Dainippon Screen Mfg A method and apparatus for facilitating alignment of images
US4652914A (en) * 1984-04-27 1987-03-24 Dainippon Screen Mfg. Co., Ltd. Method of recording register marks
EP0296192A1 (en) * 1986-12-29 1988-12-28 Hughes Aircraft Company X-Y-$g(U)-Z POSITIONING STAGE
US4891526A (en) * 1986-12-29 1990-01-02 Hughes Aircraft Company X-Y-θ-Z positioning stage
GB8727964D0 (en) * 1987-11-30 1988-01-06 Atomic Energy Authority Uk Displacement monitoring with vibration/temperature fluctuation compensation
US6038349A (en) * 1995-09-13 2000-03-14 Ricoh Company, Ltd. Simultaneous registration of multiple image fragments
US5734594A (en) * 1996-09-25 1998-03-31 Chartered Semiconductor Manufacturing Pte Ltd. Method and system for enhancement of wafer alignment accuracy

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4922276A (enExample) * 1972-06-21 1974-02-27

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3038369A (en) * 1958-12-22 1962-06-12 Bell Telephone Labor Inc Positioning a transistor by use of the optical reflectance characteristics of the electrode stripes
US3955072A (en) * 1971-03-22 1976-05-04 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects for example a semiconductor wafer and a transparent mask
JPS549900B2 (enExample) * 1972-10-13 1979-04-28
US3943359A (en) * 1973-06-15 1976-03-09 Hitachi, Ltd. Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4922276A (enExample) * 1972-06-21 1974-02-27

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53111280A (en) * 1977-03-10 1978-09-28 Canon Inc Mask or wafer for production of semiconductor elements and device for aligning these
JPS54114181A (en) * 1978-02-27 1979-09-06 Canon Inc Alignment device
JPS54152975A (en) * 1978-05-22 1979-12-01 Siemens Ag Method of and device for automatically coinciding
JPS5655041A (en) * 1979-10-11 1981-05-15 Nippon Telegr & Teleph Corp <Ntt> Positioning exposure
JPH04299332A (ja) * 1991-03-28 1992-10-22 Ushio Inc フィルム露光方法

Also Published As

Publication number Publication date
NL7605772A (nl) 1976-12-02
DE2624062C3 (de) 1980-07-24
DE2624062A1 (de) 1976-12-16
GB1546194A (en) 1979-05-16
US4170418A (en) 1979-10-09
DE2624062B2 (de) 1979-11-08
JPS5547453B2 (enExample) 1980-11-29

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