JPS5547382A - Chemical polishing fluid - Google Patents
Chemical polishing fluidInfo
- Publication number
- JPS5547382A JPS5547382A JP11948978A JP11948978A JPS5547382A JP S5547382 A JPS5547382 A JP S5547382A JP 11948978 A JP11948978 A JP 11948978A JP 11948978 A JP11948978 A JP 11948978A JP S5547382 A JPS5547382 A JP S5547382A
- Authority
- JP
- Japan
- Prior art keywords
- polishing fluid
- fluid
- polishing
- pref
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012530 fluid Substances 0.000 title abstract 9
- 238000005498 polishing Methods 0.000 title abstract 9
- 239000000126 substance Substances 0.000 title abstract 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 239000002738 chelating agent Substances 0.000 abstract 2
- CJAZCKUGLFWINJ-UHFFFAOYSA-N 3,4-dihydroxybenzene-1,2-disulfonic acid Chemical compound OC1=CC=C(S(O)(=O)=O)C(S(O)(=O)=O)=C1O CJAZCKUGLFWINJ-UHFFFAOYSA-N 0.000 abstract 1
- 229910000838 Al alloy Inorganic materials 0.000 abstract 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract 1
- 238000007743 anodising Methods 0.000 abstract 1
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 abstract 1
- -1 e.g. Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 abstract 1
- 230000000452 restraining effect Effects 0.000 abstract 1
- 229910052708 sodium Inorganic materials 0.000 abstract 1
- 239000011734 sodium Substances 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/02—Light metals
- C23F3/03—Light metals with acidic solutions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11948978A JPS5547382A (en) | 1978-09-28 | 1978-09-28 | Chemical polishing fluid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11948978A JPS5547382A (en) | 1978-09-28 | 1978-09-28 | Chemical polishing fluid |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5547382A true JPS5547382A (en) | 1980-04-03 |
JPS6212311B2 JPS6212311B2 (enrdf_load_stackoverflow) | 1987-03-18 |
Family
ID=14762525
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11948978A Granted JPS5547382A (en) | 1978-09-28 | 1978-09-28 | Chemical polishing fluid |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5547382A (enrdf_load_stackoverflow) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6562719B2 (en) | 2000-08-04 | 2003-05-13 | Hitachi, Ltd. | Methods of polishing, interconnect-fabrication, and producing semiconductor devices |
US6774041B1 (en) | 1999-12-27 | 2004-08-10 | Renesas Technology Corp. | Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device |
US7445644B2 (en) | 2005-10-28 | 2008-11-04 | The Procter & Gamble Company | Compositions containing anionically modified catechol and soil suspending polymers |
US7585376B2 (en) | 2005-10-28 | 2009-09-08 | The Procter & Gamble Company | Composition containing an esterified substituted benzene sulfonate |
US7892362B2 (en) | 2005-10-28 | 2011-02-22 | The Procter & Gamble Company | Composition containing an esterified substituted benzene sulfonate |
CN102352511A (zh) * | 2011-09-26 | 2012-02-15 | 台山市金桥铝型材厂有限公司 | 一种铝型材表面抛光处理液的制备方法 |
KR101208122B1 (ko) | 2010-03-26 | 2012-12-05 | 권유진 | 알루미늄 가공을 위한 버 제거용 조성물 및 상기 조성물을 이용한 버 제거방법 |
CN109179357A (zh) * | 2018-07-27 | 2019-01-11 | 佛山市三水雄鹰铝表面技术创新中心有限公司 | 铝行业抛光清洗废水回收复合肥方法与系统配置 |
-
1978
- 1978-09-28 JP JP11948978A patent/JPS5547382A/ja active Granted
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6774041B1 (en) | 1999-12-27 | 2004-08-10 | Renesas Technology Corp. | Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device |
US7183212B2 (en) | 1999-12-27 | 2007-02-27 | Renesas Technology Corp. | Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device |
US6562719B2 (en) | 2000-08-04 | 2003-05-13 | Hitachi, Ltd. | Methods of polishing, interconnect-fabrication, and producing semiconductor devices |
US6750128B2 (en) | 2000-08-04 | 2004-06-15 | Renesas Technology Corporation | Methods of polishing, interconnect-fabrication, and producing semiconductor devices |
US7445644B2 (en) | 2005-10-28 | 2008-11-04 | The Procter & Gamble Company | Compositions containing anionically modified catechol and soil suspending polymers |
US7585376B2 (en) | 2005-10-28 | 2009-09-08 | The Procter & Gamble Company | Composition containing an esterified substituted benzene sulfonate |
US7892362B2 (en) | 2005-10-28 | 2011-02-22 | The Procter & Gamble Company | Composition containing an esterified substituted benzene sulfonate |
US8119586B2 (en) | 2005-10-28 | 2012-02-21 | The Procter And Gamble Company | Composition containing an esterified substituted benzene sulfonate |
KR101208122B1 (ko) | 2010-03-26 | 2012-12-05 | 권유진 | 알루미늄 가공을 위한 버 제거용 조성물 및 상기 조성물을 이용한 버 제거방법 |
CN102352511A (zh) * | 2011-09-26 | 2012-02-15 | 台山市金桥铝型材厂有限公司 | 一种铝型材表面抛光处理液的制备方法 |
CN109179357A (zh) * | 2018-07-27 | 2019-01-11 | 佛山市三水雄鹰铝表面技术创新中心有限公司 | 铝行业抛光清洗废水回收复合肥方法与系统配置 |
CN109179357B (zh) * | 2018-07-27 | 2020-03-24 | 佛山市三水雄鹰铝表面技术创新中心有限公司 | 铝行业抛光清洗废水回收复合肥方法与系统配置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6212311B2 (enrdf_load_stackoverflow) | 1987-03-18 |
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