JPS5540662B2 - - Google Patents
Info
- Publication number
- JPS5540662B2 JPS5540662B2 JP15499576A JP15499576A JPS5540662B2 JP S5540662 B2 JPS5540662 B2 JP S5540662B2 JP 15499576 A JP15499576 A JP 15499576A JP 15499576 A JP15499576 A JP 15499576A JP S5540662 B2 JPS5540662 B2 JP S5540662B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3471—Introduction of auxiliary energy into the plasma
- C23C14/3478—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15499576A JPS5379776A (en) | 1976-12-24 | 1976-12-24 | Sputtering apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15499576A JPS5379776A (en) | 1976-12-24 | 1976-12-24 | Sputtering apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5379776A JPS5379776A (en) | 1978-07-14 |
| JPS5540662B2 true JPS5540662B2 (de) | 1980-10-20 |
Family
ID=15596398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15499576A Granted JPS5379776A (en) | 1976-12-24 | 1976-12-24 | Sputtering apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5379776A (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59123768A (ja) * | 1982-12-28 | 1984-07-17 | Toyota Central Res & Dev Lab Inc | 多元同時スパッタリング装置 |
| JP2507813Y2 (ja) * | 1991-08-23 | 1996-08-21 | 株式会社福岡製作所 | 車椅子用の駐輪装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4838076A (de) * | 1971-09-10 | 1973-06-05 | ||
| JPS5023382A (de) * | 1973-07-05 | 1975-03-13 | ||
| JPS5186083A (de) * | 1974-12-16 | 1976-07-28 | Airco Inc |
-
1976
- 1976-12-24 JP JP15499576A patent/JPS5379776A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4838076A (de) * | 1971-09-10 | 1973-06-05 | ||
| JPS5023382A (de) * | 1973-07-05 | 1975-03-13 | ||
| JPS5186083A (de) * | 1974-12-16 | 1976-07-28 | Airco Inc |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5379776A (en) | 1978-07-14 |