JPS5540411A - Resist composition for microformation - Google Patents
Resist composition for microformationInfo
- Publication number
- JPS5540411A JPS5540411A JP11289778A JP11289778A JPS5540411A JP S5540411 A JPS5540411 A JP S5540411A JP 11289778 A JP11289778 A JP 11289778A JP 11289778 A JP11289778 A JP 11289778A JP S5540411 A JPS5540411 A JP S5540411A
- Authority
- JP
- Japan
- Prior art keywords
- polymerization inhibitor
- radical scavenger
- resist composition
- microformation
- polymer material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53112897A JPS5857731B2 (ja) | 1978-09-16 | 1978-09-16 | プラズマエッチング用レジスト組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53112897A JPS5857731B2 (ja) | 1978-09-16 | 1978-09-16 | プラズマエッチング用レジスト組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5540411A true JPS5540411A (en) | 1980-03-21 |
JPS5857731B2 JPS5857731B2 (ja) | 1983-12-21 |
Family
ID=14598232
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53112897A Expired JPS5857731B2 (ja) | 1978-09-16 | 1978-09-16 | プラズマエッチング用レジスト組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5857731B2 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5784452A (en) * | 1980-11-14 | 1982-05-26 | Sanyo Electric Co Ltd | Positive type resist for use in electron beams |
JPS58502169A (ja) * | 1981-12-21 | 1983-12-15 | インステイテユ−ト ヒミイ アカデミイ ナウク エスエスエスア−ル | フォト−及び電子線レジスト |
JPS59198122A (ja) * | 1983-04-25 | 1984-11-09 | Tokuyama Soda Co Ltd | 粗面化ポリプロピレンフイルムの製法 |
JPS59211908A (ja) * | 1983-05-17 | 1984-11-30 | 株式会社東芝 | 油入フイルムコンデンサ |
JPS6023023A (ja) * | 1983-07-20 | 1985-02-05 | Tokuyama Soda Co Ltd | 粗面化ポリプロピレンフィルムの製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53102025A (en) * | 1977-02-18 | 1978-09-06 | Hitachi Ltd | Radiation sensitive organic high molecular material |
-
1978
- 1978-09-16 JP JP53112897A patent/JPS5857731B2/ja not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53102025A (en) * | 1977-02-18 | 1978-09-06 | Hitachi Ltd | Radiation sensitive organic high molecular material |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5784452A (en) * | 1980-11-14 | 1982-05-26 | Sanyo Electric Co Ltd | Positive type resist for use in electron beams |
JPH0128936B2 (ja) * | 1980-11-14 | 1989-06-06 | Sanyo Electric Co | |
JPS58502169A (ja) * | 1981-12-21 | 1983-12-15 | インステイテユ−ト ヒミイ アカデミイ ナウク エスエスエスア−ル | フォト−及び電子線レジスト |
JPS59198122A (ja) * | 1983-04-25 | 1984-11-09 | Tokuyama Soda Co Ltd | 粗面化ポリプロピレンフイルムの製法 |
JPH034372B2 (ja) * | 1983-04-25 | 1991-01-22 | Tokuyama Soda Kk | |
JPS59211908A (ja) * | 1983-05-17 | 1984-11-30 | 株式会社東芝 | 油入フイルムコンデンサ |
JPS6360483B2 (ja) * | 1983-05-17 | 1988-11-24 | ||
JPS6023023A (ja) * | 1983-07-20 | 1985-02-05 | Tokuyama Soda Co Ltd | 粗面化ポリプロピレンフィルムの製造方法 |
JPH036896B2 (ja) * | 1983-07-20 | 1991-01-31 | Tokuyama Soda Kk |
Also Published As
Publication number | Publication date |
---|---|
JPS5857731B2 (ja) | 1983-12-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS53125491A (en) | Fluorine-containing polymer easily curable and its curable composition | |
JPS5222578A (en) | Stabilizing agent for organic materials | |
JPS52117985A (en) | Photosensitive polymer composition | |
JPS5363310A (en) | Preparation of monomer composition containing pb and preparation of polymerhaving radiation shielding ability | |
JPS5259644A (en) | Stabilizer for polymer | |
JPS5540411A (en) | Resist composition for microformation | |
JPS53102025A (en) | Radiation sensitive organic high molecular material | |
JPS5217555A (en) | Fluorine-containing copolymer compositions containing carbonaceous mat erials | |
JPS51148740A (en) | Method of crosslinking polymers | |
JPS5232948A (en) | Co-cross linking polymer composition | |
JPS51116851A (en) | Thixotropic radical polymerization type thermosetting resin compositio ns | |
JPS51136736A (en) | Polyolefin composition | |
JPS51142488A (en) | Novel photocromic material | |
JPS5375291A (en) | Casting composition | |
JPS5423651A (en) | Readily processing polychloroprene rubber composition | |
JPS5223144A (en) | Polymer composition stabilised against ultraviolet rays | |
JPS5365360A (en) | Pore-sealing of multiporous article | |
JPS5399292A (en) | Heat decomposable photosensitive resin composition | |
JPS5228760A (en) | Adiabatic material | |
JPS5233987A (en) | Preparation of vinyl chloride polymer | |
JPS52135385A (en) | Improved laminates | |
JPS5292258A (en) | Production of crosslinked and flame-retardant shaped articles | |
JPS5336547A (en) | Stabilized rubber composition | |
JPS5240559A (en) | Acrylate resin compositions modified with thixotropic urethanes | |
JPS5767928A (en) | Positive type resist for dry etching |