JPS5532125A - Bias write method in character pattern generator - Google Patents
Bias write method in character pattern generatorInfo
- Publication number
- JPS5532125A JPS5532125A JP10462978A JP10462978A JPS5532125A JP S5532125 A JPS5532125 A JP S5532125A JP 10462978 A JP10462978 A JP 10462978A JP 10462978 A JP10462978 A JP 10462978A JP S5532125 A JPS5532125 A JP S5532125A
- Authority
- JP
- Japan
- Prior art keywords
- stated
- laser source
- character
- starts
- completion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To remove undesirable effects caused by residual images by applying a stated bias to the image pick-up surface after completing read operation in a picture pick-up device.
CONSTITUTION: Read operation enters the positional signals of (Xi, Yi) corresponding to a character position into shift registers 16 and 18 by means of position specification circuit 15, adds the signals to vertical and horizontal scanning signals respectively through D/A converters 17 and 19 and enters the added result to deflecting circuits 10 and 13, so that the section of the stated character is read out. Generation of electronic beams is stopped accompanied with the completion of reading and then motor starts access. After radiating character board 1 for a stated exposing period by means of laser source 3, laser source 3 is set to off and the section to be read out successively is erased. After confirming the completion of erasing and access, laser source 3 is set to on again, so that exposure starts and then reading starts after exposute for a stated period.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10462978A JPS5532125A (en) | 1978-08-28 | 1978-08-28 | Bias write method in character pattern generator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10462978A JPS5532125A (en) | 1978-08-28 | 1978-08-28 | Bias write method in character pattern generator |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5532125A true JPS5532125A (en) | 1980-03-06 |
Family
ID=14385723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10462978A Pending JPS5532125A (en) | 1978-08-28 | 1978-08-28 | Bias write method in character pattern generator |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5532125A (en) |
-
1978
- 1978-08-28 JP JP10462978A patent/JPS5532125A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS57204547A (en) | Exposing method | |
DE3269741D1 (en) | Process and device for the copying retouching in the electronic colour picture reproduction | |
JPS5511303A (en) | Electron-beam exposure device | |
EP0873006A3 (en) | Photoplotting method and apparatus for recording a computer-stored raster image on an even, light-sensitive recording medium | |
JPS5532125A (en) | Bias write method in character pattern generator | |
JPS5778527A (en) | Image recording method | |
JPS56105579A (en) | Original position correcting device | |
JPS57170680A (en) | Magnetic recorder and reproducer | |
JPS57150274A (en) | Image output device | |
JPS57204033A (en) | Formation of fine pattern | |
SE9101618L (en) | PROCEDURE AND DEVICE FOR AUTOMATED EXPOSURE OF BRIGHTNESS MATERIAL MEDIUM LASER LIGHT | |
JPS5553735A (en) | Reading character scanning start point setting method for character generator | |
JPS51147260A (en) | Inspecting method of resist pattern | |
JPS5820135B2 (en) | Field junction electron beam exposure equipment | |
DE3469670D1 (en) | Assembling components on a printed circuit board | |
JPS63283021A (en) | Exposing method | |
JPS5655257A (en) | Scanning type plate making device | |
JPS545665A (en) | Electron beam exposure device | |
JPS5429915A (en) | Signal conversion method and its unit | |
JPS5442979A (en) | Electron beam exposure device | |
JPS5542013A (en) | Automatic appearance test system | |
DE3482501D1 (en) | METHOD FOR PRODUCING LARGE AREA INTEGRATED CIRCUITS. | |
ATE15949T1 (en) | METHOD AND DEVICE FOR THE PRODUCTION OF EXPOSURE MASKS FOR THE MANUFACTURE OF A RECORDING CARRIER WITH A RECORDING OF HIGH INFORMATION DENSITY. | |
JPH0420047Y2 (en) | ||
JPH0553294A (en) | Substrate negative plate formation device |