JPS552763A - Electrolysis method of chlorine compound etching solution - Google Patents

Abstract

PURPOSE: To reduce replenishing amount of chlorine and improve electrolysis efficiency by leading the etching solution which has recovered metals and the chlorine gas evolved in anode from the electrolytic cell into an absorption cell and returning the chlorine gas exhausted from the absorption cell into the electrolytic cell.

CONSTITUTION: Etching solution which contains a large amount of copper by etching printed substrates and the like is sent from a storage takn 1 into an electrolytic cell, where electrolysis is performed and the copper deposited on the cathode is recovered from a take-out port 21. The etching solution which copper has been recovered is fed to the lower part of an absorption cell 3 and the chlorine gas evolved on the anode side is fed to the blow-out pipe 32 of the absorption cell 3, allowing its primary absorption into the etching solution in the lower part of the absorption cell 3 to take place. Further, its secondary absorption into the circulating etching solution is let to take place by a pump 92. The remaining chlorine gas is returned from the top of the absorption cell 3 into the chamber 23 of the electrolytic cell 2. The etching solution having absorbed the chlorine gas is sent from the absorption cell 3 to a mixing cell 6, where the deficiency of chlorine is measured. The hydrochloric acid of the amount corresponding to the deficiency is sent from a dydrochloric acid tank 5 into the mixing cell 6, by which the etching solution is regenerated. The regenated etching solution is then fed into a regenerated solution storage tank 7.

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