JPS5527602A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS5527602A JPS5527602A JP9994778A JP9994778A JPS5527602A JP S5527602 A JPS5527602 A JP S5527602A JP 9994778 A JP9994778 A JP 9994778A JP 9994778 A JP9994778 A JP 9994778A JP S5527602 A JPS5527602 A JP S5527602A
- Authority
- JP
- Japan
- Prior art keywords
- counter
- register
- output
- comparator
- contents
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To reduce time required for picture drawing, by adding a double clock pulse generator circuit to a counter circuit and thereby operating interlaced scanning. CONSTITUTION:Start-point data X1 and end-point data X2 are loaded respectively to X1 register 13, X2 register 15 and X counter 14 by X1 and X2 load signals. Next, the contents of X, register 13 and X counter 14 are compared by X1 comparator 16, and the contents of X2 register 15 and X counter 14 are compared by comparator 17. When a coincidence signal is output by X1 and X2 comparators 16 and 17, controller 18 produces an up or down pulse in accordance with the output. When this pulse is impressed on X counter 14 via double pulse generator circuits 20a and 20b, X counter counts two in the direction from X1 to X2 or in the direction from X2 to X1. Consequently, interlaced exposure can be done by the scanning by the output of X counter 14.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9994778A JPS5527602A (en) | 1978-08-18 | 1978-08-18 | Electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9994778A JPS5527602A (en) | 1978-08-18 | 1978-08-18 | Electron beam exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5527602A true JPS5527602A (en) | 1980-02-27 |
Family
ID=14260896
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9994778A Pending JPS5527602A (en) | 1978-08-18 | 1978-08-18 | Electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5527602A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60106905A (en) * | 1983-11-15 | 1985-06-12 | Hitachi Metals Ltd | Production of permanent magnet alloy powder |
JPS60155608A (en) * | 1983-12-20 | 1985-08-15 | エクソン リサ−チ アンド エンヂニアリング コムパニ− | Reduction of producing powdery alloy from mixed metal iron oxide |
JPS63105909A (en) * | 1986-04-30 | 1988-05-11 | Sumitomo Metal Mining Co Ltd | Production of sintered alloy |
-
1978
- 1978-08-18 JP JP9994778A patent/JPS5527602A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60106905A (en) * | 1983-11-15 | 1985-06-12 | Hitachi Metals Ltd | Production of permanent magnet alloy powder |
JPS60155608A (en) * | 1983-12-20 | 1985-08-15 | エクソン リサ−チ アンド エンヂニアリング コムパニ− | Reduction of producing powdery alloy from mixed metal iron oxide |
JPS63105909A (en) * | 1986-04-30 | 1988-05-11 | Sumitomo Metal Mining Co Ltd | Production of sintered alloy |
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