JPS5526577A - Developing method of lithographic material not requiring wetting water - Google Patents

Developing method of lithographic material not requiring wetting water

Info

Publication number
JPS5526577A
JPS5526577A JP10021978A JP10021978A JPS5526577A JP S5526577 A JPS5526577 A JP S5526577A JP 10021978 A JP10021978 A JP 10021978A JP 10021978 A JP10021978 A JP 10021978A JP S5526577 A JPS5526577 A JP S5526577A
Authority
JP
Japan
Prior art keywords
photosensitive resin
silicone rubber
aliphatic hydrocarbons
line portions
picture line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10021978A
Other languages
Japanese (ja)
Other versions
JPS61613B2 (en
Inventor
Takao Kinashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP10021978A priority Critical patent/JPS5526577A/en
Publication of JPS5526577A publication Critical patent/JPS5526577A/en
Publication of JPS61613B2 publication Critical patent/JPS61613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Abstract

PURPOSE:To obtain the beautiful printed matter free from ground soiling by using the developing material containing aliphatic hydrocarbons at the time of removing the non-picture line portions of the photosensitive resin layer on a silicone rubber layer. CONSTITUTION:A photosensitive resin layer is formed on a polypropylene film (PP) and a silane coupling agent is coated thereon and is then dried, after which the solution of silicone rubber is coated. Next, the foregoing photosensitive resin layer is compression bonded to the substrate comprising coating silicone primer on the chemically formed Al plate. After this, it is image exposed, is peeled of PP and is then developed by the mixed solution (ratio of 90/10) of aliphatic hydrocarbons of C5-20 and isopropanol, etc. The inclusion of aliphatic hydrocarbons which do not show solubility to the photosensitive resin of the non-picture line portions in the developing solution prevents contamination of the silicone rubber layer by the contaminants produced through reaction of the coupling agent and primer with the photosensitive resin. Hence, the silicone rubber of the non-picture line portions repel ink sufficiently.
JP10021978A 1978-08-17 1978-08-17 Developing method of lithographic material not requiring wetting water Granted JPS5526577A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10021978A JPS5526577A (en) 1978-08-17 1978-08-17 Developing method of lithographic material not requiring wetting water

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10021978A JPS5526577A (en) 1978-08-17 1978-08-17 Developing method of lithographic material not requiring wetting water

Publications (2)

Publication Number Publication Date
JPS5526577A true JPS5526577A (en) 1980-02-26
JPS61613B2 JPS61613B2 (en) 1986-01-09

Family

ID=14268179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10021978A Granted JPS5526577A (en) 1978-08-17 1978-08-17 Developing method of lithographic material not requiring wetting water

Country Status (1)

Country Link
JP (1) JPS5526577A (en)

Also Published As

Publication number Publication date
JPS61613B2 (en) 1986-01-09

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