JPS55166645A - Photosensitive lithographic plate - Google Patents
Photosensitive lithographic plateInfo
- Publication number
- JPS55166645A JPS55166645A JP7425879A JP7425879A JPS55166645A JP S55166645 A JPS55166645 A JP S55166645A JP 7425879 A JP7425879 A JP 7425879A JP 7425879 A JP7425879 A JP 7425879A JP S55166645 A JPS55166645 A JP S55166645A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- nonsilver
- photosensitive
- contg
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011347 resin Substances 0.000 abstract 4
- 229920005989 resin Polymers 0.000 abstract 4
- 239000000839 emulsion Substances 0.000 abstract 2
- 239000010419 fine particle Substances 0.000 abstract 2
- 229910052709 silver Inorganic materials 0.000 abstract 2
- 239000004332 silver Substances 0.000 abstract 2
- -1 silver halide Chemical class 0.000 abstract 2
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229930003836 cresol Natural products 0.000 abstract 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 239000005011 phenolic resin Substances 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7425879A JPS55166645A (en) | 1979-06-13 | 1979-06-13 | Photosensitive lithographic plate |
| GB8019106A GB2052084B (en) | 1979-06-13 | 1980-06-11 | Process for preparing photosensitive lithographic printing plate precursor |
| DE19803022254 DE3022254C2 (de) | 1979-06-13 | 1980-06-13 | Verfahren zur Herstellung von lichtempfindlichen lithographischen Druckplatten |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7425879A JPS55166645A (en) | 1979-06-13 | 1979-06-13 | Photosensitive lithographic plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55166645A true JPS55166645A (en) | 1980-12-25 |
| JPS6155666B2 JPS6155666B2 (enrdf_load_stackoverflow) | 1986-11-28 |
Family
ID=13541934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7425879A Granted JPS55166645A (en) | 1979-06-13 | 1979-06-13 | Photosensitive lithographic plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55166645A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62196978U (enrdf_load_stackoverflow) * | 1986-06-04 | 1987-12-15 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS513241A (enrdf_load_stackoverflow) * | 1974-05-28 | 1976-01-12 | Xerox Corp | |
| JPS54152502A (en) * | 1978-05-19 | 1979-11-30 | Fuji Photo Film Co Ltd | Photosensitive printing plate material and method of making printing plate from said material |
-
1979
- 1979-06-13 JP JP7425879A patent/JPS55166645A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS513241A (enrdf_load_stackoverflow) * | 1974-05-28 | 1976-01-12 | Xerox Corp | |
| JPS54152502A (en) * | 1978-05-19 | 1979-11-30 | Fuji Photo Film Co Ltd | Photosensitive printing plate material and method of making printing plate from said material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6155666B2 (enrdf_load_stackoverflow) | 1986-11-28 |
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