JPS55156867A - Potential measuring device - Google Patents
Potential measuring deviceInfo
- Publication number
- JPS55156867A JPS55156867A JP6502979A JP6502979A JPS55156867A JP S55156867 A JPS55156867 A JP S55156867A JP 6502979 A JP6502979 A JP 6502979A JP 6502979 A JP6502979 A JP 6502979A JP S55156867 A JPS55156867 A JP S55156867A
- Authority
- JP
- Japan
- Prior art keywords
- grid
- secondary electron
- detector
- output
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/305—Contactless testing using electron beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2443—Scintillation detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Tests Of Electronic Circuits (AREA)
- Electron Tubes For Measurement (AREA)
- Measurement Of Current Or Voltage (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6502979A JPS55156867A (en) | 1979-05-28 | 1979-05-28 | Potential measuring device |
US06/152,843 US4355232A (en) | 1979-05-28 | 1980-05-23 | Apparatus for measuring specimen potential in electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6502979A JPS55156867A (en) | 1979-05-28 | 1979-05-28 | Potential measuring device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55156867A true JPS55156867A (en) | 1980-12-06 |
JPH0135304B2 JPH0135304B2 (ja) | 1989-07-25 |
Family
ID=13275133
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6502979A Granted JPS55156867A (en) | 1979-05-28 | 1979-05-28 | Potential measuring device |
Country Status (2)
Country | Link |
---|---|
US (1) | US4355232A (ja) |
JP (1) | JPS55156867A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3206309A1 (de) * | 1982-02-22 | 1983-09-15 | Siemens AG, 1000 Berlin und 8000 München | Sekundaerelektronen-spektrometer und verfahren zu seinem betrieb |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3138929A1 (de) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | Verbessertes sekundaerelektronen-spektrometer fuer die potentialmessung an einer probe mit einer elektronensonde |
US4596929A (en) * | 1983-11-21 | 1986-06-24 | Nanometrics Incorporated | Three-stage secondary emission electron detection in electron microscopes |
GB8515250D0 (en) * | 1985-06-17 | 1985-07-17 | Texas Instruments Ltd | Testing of integrated circuits |
US4697080A (en) * | 1986-01-06 | 1987-09-29 | The United States Of America As Represented By The United States Department Of Energy | Analysis with electron microscope of multielement samples using pure element standards |
US4837506A (en) * | 1986-10-02 | 1989-06-06 | Ultraprobe, Inc. | Apparatus including a focused UV light source for non-contact measuremenht and alteration of electrical properties of conductors |
JPH065691B2 (ja) * | 1987-09-26 | 1994-01-19 | 株式会社東芝 | 半導体素子の試験方法および試験装置 |
JPH03101041A (ja) * | 1989-09-14 | 1991-04-25 | Hitachi Ltd | 電子ビームによる電圧測定装置 |
JP2972832B2 (ja) * | 1992-10-19 | 1999-11-08 | シャープ株式会社 | スペクトルシフト補正機能付き電子分光分析装置及び電子分光分析のスペクトルシフト補正方法 |
DE69900869T2 (de) * | 1999-07-29 | 2002-07-18 | Advantest Corp | Verfahren und Vorrichtung zur Prüfung eines elektronischen Bauteils |
JP5164317B2 (ja) * | 2005-08-19 | 2013-03-21 | 株式会社日立ハイテクノロジーズ | 電子線による検査・計測方法および検査・計測装置 |
FR2897690B1 (fr) * | 2006-02-17 | 2008-04-18 | Commissariat Energie Atomique | Dispositif de test de connexions electriques, sans contact |
DE102015210893B4 (de) * | 2015-06-15 | 2019-05-09 | Carl Zeiss Microscopy Gmbh | Analyseeinrichtung zur Analyse der Energie geladener Teilchen und Teilchenstrahlgerät mit einer Analyseeinrichtung |
CA3012184A1 (en) * | 2016-01-21 | 2017-07-27 | Japan Synchrotron Radiation Research Institute | Retarding potential type energy analyzer |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1246744A (en) * | 1969-01-02 | 1971-09-15 | Graham Stuart Plows | Electron beam apparatus |
GB1596105A (en) * | 1978-02-20 | 1981-08-19 | Nat Res Dev | Electrostatic engergy analysis |
US4179604A (en) * | 1978-09-29 | 1979-12-18 | The United States Of America As Represented By The Secretary Of The Navy | Electron collector for forming low-loss electron images |
DE2902495A1 (de) * | 1979-01-23 | 1980-07-31 | Siemens Ag | Einrichtung zur beruehrungslosen potentialmessung |
-
1979
- 1979-05-28 JP JP6502979A patent/JPS55156867A/ja active Granted
-
1980
- 1980-05-23 US US06/152,843 patent/US4355232A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3206309A1 (de) * | 1982-02-22 | 1983-09-15 | Siemens AG, 1000 Berlin und 8000 München | Sekundaerelektronen-spektrometer und verfahren zu seinem betrieb |
Also Published As
Publication number | Publication date |
---|---|
JPH0135304B2 (ja) | 1989-07-25 |
US4355232A (en) | 1982-10-19 |
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