JPS5515217A - Working method for semiconductor and its working apparatus - Google Patents

Working method for semiconductor and its working apparatus

Info

Publication number
JPS5515217A
JPS5515217A JP8786378A JP8786378A JPS5515217A JP S5515217 A JPS5515217 A JP S5515217A JP 8786378 A JP8786378 A JP 8786378A JP 8786378 A JP8786378 A JP 8786378A JP S5515217 A JPS5515217 A JP S5515217A
Authority
JP
Japan
Prior art keywords
wafer
cylindrical casing
etching solution
sponge
oxidization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8786378A
Other languages
English (en)
Inventor
Fumio Shimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP8786378A priority Critical patent/JPS5515217A/ja
Publication of JPS5515217A publication Critical patent/JPS5515217A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Mechanical Treatment Of Semiconductor (AREA)
JP8786378A 1978-07-18 1978-07-18 Working method for semiconductor and its working apparatus Pending JPS5515217A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8786378A JPS5515217A (en) 1978-07-18 1978-07-18 Working method for semiconductor and its working apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8786378A JPS5515217A (en) 1978-07-18 1978-07-18 Working method for semiconductor and its working apparatus

Publications (1)

Publication Number Publication Date
JPS5515217A true JPS5515217A (en) 1980-02-02

Family

ID=13926714

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8786378A Pending JPS5515217A (en) 1978-07-18 1978-07-18 Working method for semiconductor and its working apparatus

Country Status (1)

Country Link
JP (1) JPS5515217A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088535U (ja) * 1983-11-24 1985-06-18 住友電気工業株式会社 半導体ウエハ
JPS63222434A (ja) * 1987-03-11 1988-09-16 Nippon Mining Co Ltd 鏡面研磨化合物半導体矩形ウエハの製造方法
WO2008052519A1 (de) * 2006-11-03 2008-05-08 Mtu Aero Engines Gmbh Entschichtungsvorrichtung für rotationssymmetrische bauteile, insbesondere aus flugzeugtriebwerken

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088535U (ja) * 1983-11-24 1985-06-18 住友電気工業株式会社 半導体ウエハ
JPS63222434A (ja) * 1987-03-11 1988-09-16 Nippon Mining Co Ltd 鏡面研磨化合物半導体矩形ウエハの製造方法
WO2008052519A1 (de) * 2006-11-03 2008-05-08 Mtu Aero Engines Gmbh Entschichtungsvorrichtung für rotationssymmetrische bauteile, insbesondere aus flugzeugtriebwerken
US20100263694A1 (en) * 2006-11-03 2010-10-21 Mtu Aero Engines Gmbh Decoating device for axially symmetric components, particularly from aircraft engines

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