JPS55149942A - Treatment for forming pattern on resist layer - Google Patents
Treatment for forming pattern on resist layerInfo
- Publication number
- JPS55149942A JPS55149942A JP5366880A JP5366880A JPS55149942A JP S55149942 A JPS55149942 A JP S55149942A JP 5366880 A JP5366880 A JP 5366880A JP 5366880 A JP5366880 A JP 5366880A JP S55149942 A JPS55149942 A JP S55149942A
- Authority
- JP
- Japan
- Prior art keywords
- treatment
- resist layer
- forming pattern
- pattern
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3279779A | 1979-04-24 | 1979-04-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55149942A true JPS55149942A (en) | 1980-11-21 |
JPS6332178B2 JPS6332178B2 (en) | 1988-06-28 |
Family
ID=21866854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5366880A Granted JPS55149942A (en) | 1979-04-24 | 1980-04-24 | Treatment for forming pattern on resist layer |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS55149942A (en) |
DE (1) | DE3015866A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56500627A (en) * | 1979-05-31 | 1981-05-07 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3801390A (en) * | 1970-12-28 | 1974-04-02 | Bell Telephone Labor Inc | Preparation of high resolution shadow masks |
-
1980
- 1980-04-24 JP JP5366880A patent/JPS55149942A/en active Granted
- 1980-04-24 DE DE19803015866 patent/DE3015866A1/en not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56500627A (en) * | 1979-05-31 | 1981-05-07 |
Also Published As
Publication number | Publication date |
---|---|
JPS6332178B2 (en) | 1988-06-28 |
DE3015866A1 (en) | 1980-11-06 |
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