JPS55149942A - Treatment for forming pattern on resist layer - Google Patents

Treatment for forming pattern on resist layer

Info

Publication number
JPS55149942A
JPS55149942A JP5366880A JP5366880A JPS55149942A JP S55149942 A JPS55149942 A JP S55149942A JP 5366880 A JP5366880 A JP 5366880A JP 5366880 A JP5366880 A JP 5366880A JP S55149942 A JPS55149942 A JP S55149942A
Authority
JP
Japan
Prior art keywords
treatment
resist layer
forming pattern
pattern
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5366880A
Other languages
Japanese (ja)
Other versions
JPS6332178B2 (en
Inventor
Baatoko Jiyon
Erio Fueriisu Patoritsuku
Donarudo Buraisu Fuiritsupu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CBS Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of JPS55149942A publication Critical patent/JPS55149942A/en
Publication of JPS6332178B2 publication Critical patent/JPS6332178B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2037Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
JP5366880A 1979-04-24 1980-04-24 Treatment for forming pattern on resist layer Granted JPS55149942A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3279779A 1979-04-24 1979-04-24

Publications (2)

Publication Number Publication Date
JPS55149942A true JPS55149942A (en) 1980-11-21
JPS6332178B2 JPS6332178B2 (en) 1988-06-28

Family

ID=21866854

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5366880A Granted JPS55149942A (en) 1979-04-24 1980-04-24 Treatment for forming pattern on resist layer

Country Status (2)

Country Link
JP (1) JPS55149942A (en)
DE (1) DE3015866A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56500627A (en) * 1979-05-31 1981-05-07

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3801390A (en) * 1970-12-28 1974-04-02 Bell Telephone Labor Inc Preparation of high resolution shadow masks

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56500627A (en) * 1979-05-31 1981-05-07

Also Published As

Publication number Publication date
JPS6332178B2 (en) 1988-06-28
DE3015866A1 (en) 1980-11-06

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