JPS55130817A - Producing boron structural material - Google Patents
Producing boron structural materialInfo
- Publication number
- JPS55130817A JPS55130817A JP3816779A JP3816779A JPS55130817A JP S55130817 A JPS55130817 A JP S55130817A JP 3816779 A JP3816779 A JP 3816779A JP 3816779 A JP3816779 A JP 3816779A JP S55130817 A JPS55130817 A JP S55130817A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- boron
- layer
- structural material
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3816779A JPS55130817A (en) | 1979-03-29 | 1979-03-29 | Producing boron structural material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3816779A JPS55130817A (en) | 1979-03-29 | 1979-03-29 | Producing boron structural material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55130817A true JPS55130817A (en) | 1980-10-11 |
| JPS6141846B2 JPS6141846B2 (enExample) | 1986-09-18 |
Family
ID=12517834
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3816779A Granted JPS55130817A (en) | 1979-03-29 | 1979-03-29 | Producing boron structural material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55130817A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1595976A4 (en) * | 2003-02-19 | 2011-05-04 | Ulvac Inc | FILM COMPONENT COMPONENT AND METHOD OF CLEANING THE SAME |
| CN111212814A (zh) * | 2017-10-17 | 2020-05-29 | 株式会社德山 | 硼构造体以及硼粉末 |
-
1979
- 1979-03-29 JP JP3816779A patent/JPS55130817A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1595976A4 (en) * | 2003-02-19 | 2011-05-04 | Ulvac Inc | FILM COMPONENT COMPONENT AND METHOD OF CLEANING THE SAME |
| US8216654B2 (en) | 2003-02-19 | 2012-07-10 | Ulvac, Inc. | Components for a film-forming device and method for cleaning the same |
| CN111212814A (zh) * | 2017-10-17 | 2020-05-29 | 株式会社德山 | 硼构造体以及硼粉末 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6141846B2 (enExample) | 1986-09-18 |
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