JPS55126251A - Mask positioning mechanism in transfer unit - Google Patents

Mask positioning mechanism in transfer unit

Info

Publication number
JPS55126251A
JPS55126251A JP3320779A JP3320779A JPS55126251A JP S55126251 A JPS55126251 A JP S55126251A JP 3320779 A JP3320779 A JP 3320779A JP 3320779 A JP3320779 A JP 3320779A JP S55126251 A JPS55126251 A JP S55126251A
Authority
JP
Japan
Prior art keywords
mask
stoppers
positioning
fitting
transfer unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3320779A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6339897B2 (enrdf_load_stackoverflow
Inventor
Masahiro Okabe
Yoshitaka Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3320779A priority Critical patent/JPS55126251A/ja
Publication of JPS55126251A publication Critical patent/JPS55126251A/ja
Publication of JPS6339897B2 publication Critical patent/JPS6339897B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP3320779A 1979-03-23 1979-03-23 Mask positioning mechanism in transfer unit Granted JPS55126251A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3320779A JPS55126251A (en) 1979-03-23 1979-03-23 Mask positioning mechanism in transfer unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3320779A JPS55126251A (en) 1979-03-23 1979-03-23 Mask positioning mechanism in transfer unit

Publications (2)

Publication Number Publication Date
JPS55126251A true JPS55126251A (en) 1980-09-29
JPS6339897B2 JPS6339897B2 (enrdf_load_stackoverflow) 1988-08-08

Family

ID=12380009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3320779A Granted JPS55126251A (en) 1979-03-23 1979-03-23 Mask positioning mechanism in transfer unit

Country Status (1)

Country Link
JP (1) JPS55126251A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121048A (ja) * 1982-12-27 1984-07-12 Ibiden Co Ltd プリント配線基板の製造装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121048A (ja) * 1982-12-27 1984-07-12 Ibiden Co Ltd プリント配線基板の製造装置

Also Published As

Publication number Publication date
JPS6339897B2 (enrdf_load_stackoverflow) 1988-08-08

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