JPS55126239A - Antistatic photographic material - Google Patents
Antistatic photographic materialInfo
- Publication number
- JPS55126239A JPS55126239A JP3220779A JP3220779A JPS55126239A JP S55126239 A JPS55126239 A JP S55126239A JP 3220779 A JP3220779 A JP 3220779A JP 3220779 A JP3220779 A JP 3220779A JP S55126239 A JPS55126239 A JP S55126239A
- Authority
- JP
- Japan
- Prior art keywords
- support
- conductive layer
- hydrophobic polymer
- per
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/853—Inorganic compounds, e.g. metals
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Abstract
PURPOSE:To obtain a photographic material retaining antistatic property even in high temperature fast development and not undergoing deterioration of antitack property under high humidity, by providing a conductive layer and a hydrophobic polymer-containing layer on the reverse side of a support having photographic layers on its opposite side. CONSTITUTION:On the reverse side of the support are provided the first conductive layer made of colloidal silica (mean particle diameter 5-30mmu) with an electrolyte, such as inorganic acid or carboxylic acid incorporated by 10<-4>-10<-2>mol per 1g of silica and the second layer containing a hydrophobic polymer, such as cellulose diacetate, a fluorine-containing polymer, or polyvinylacetal. The preferable amounts of the first and second layers to be coated are 10-500mg and 5-100mg per m<2> of support, respectively. The above hydrophobic polymer may be added to the first conductive layer and in this case the amount to be added is 0.05-5g per 1g of silica.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3220779A JPS55126239A (en) | 1979-03-22 | 1979-03-22 | Antistatic photographic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3220779A JPS55126239A (en) | 1979-03-22 | 1979-03-22 | Antistatic photographic material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS55126239A true JPS55126239A (en) | 1980-09-29 |
Family
ID=12352453
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3220779A Pending JPS55126239A (en) | 1979-03-22 | 1979-03-22 | Antistatic photographic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55126239A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0296656A2 (en) * | 1987-06-26 | 1988-12-28 | Agfa-Gevaert N.V. | Manufacture of antistatic materials |
| US5236818A (en) * | 1992-11-02 | 1993-08-17 | Minnesota Mining And Manufacturing Company | Antistatic coatings |
| JPH0571573U (en) * | 1992-03-03 | 1993-09-28 | 株式会社アカギ | Fastener for piping |
| US5344751A (en) * | 1993-05-28 | 1994-09-06 | Minnesota Mining And Manufacturing Company | Antistatic coatings |
-
1979
- 1979-03-22 JP JP3220779A patent/JPS55126239A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0296656A2 (en) * | 1987-06-26 | 1988-12-28 | Agfa-Gevaert N.V. | Manufacture of antistatic materials |
| JPH0571573U (en) * | 1992-03-03 | 1993-09-28 | 株式会社アカギ | Fastener for piping |
| US5236818A (en) * | 1992-11-02 | 1993-08-17 | Minnesota Mining And Manufacturing Company | Antistatic coatings |
| US5344751A (en) * | 1993-05-28 | 1994-09-06 | Minnesota Mining And Manufacturing Company | Antistatic coatings |
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