JPS55122869A - Coating method for hafnium carbide (hfc) - Google Patents

Coating method for hafnium carbide (hfc)

Info

Publication number
JPS55122869A
JPS55122869A JP2919379A JP2919379A JPS55122869A JP S55122869 A JPS55122869 A JP S55122869A JP 2919379 A JP2919379 A JP 2919379A JP 2919379 A JP2919379 A JP 2919379A JP S55122869 A JPS55122869 A JP S55122869A
Authority
JP
Japan
Prior art keywords
hfc
substrate
heated
iodide
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2919379A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6215634B2 (enExample
Inventor
Moriaki Fuyama
Mitsuru Ura
Haruhiko Honda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP2919379A priority Critical patent/JPS55122869A/ja
Publication of JPS55122869A publication Critical patent/JPS55122869A/ja
Publication of JPS6215634B2 publication Critical patent/JPS6215634B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)
JP2919379A 1979-03-13 1979-03-13 Coating method for hafnium carbide (hfc) Granted JPS55122869A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2919379A JPS55122869A (en) 1979-03-13 1979-03-13 Coating method for hafnium carbide (hfc)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2919379A JPS55122869A (en) 1979-03-13 1979-03-13 Coating method for hafnium carbide (hfc)

Publications (2)

Publication Number Publication Date
JPS55122869A true JPS55122869A (en) 1980-09-20
JPS6215634B2 JPS6215634B2 (enExample) 1987-04-08

Family

ID=12269356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2919379A Granted JPS55122869A (en) 1979-03-13 1979-03-13 Coating method for hafnium carbide (hfc)

Country Status (1)

Country Link
JP (1) JPS55122869A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106826108A (zh) * 2016-12-26 2017-06-13 常熟市惠机电有限公司 一种耐高温阀门连接件的制备方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106826108A (zh) * 2016-12-26 2017-06-13 常熟市惠机电有限公司 一种耐高温阀门连接件的制备方法

Also Published As

Publication number Publication date
JPS6215634B2 (enExample) 1987-04-08

Similar Documents

Publication Publication Date Title
DE3171684D1 (en) Method for mechanical energy production from heat using a mixture of fluids as the working fluid
NZ235700A (en) Preparing reactant gas for glass coating by injecting liquid precursor as film on vapourisation chamber wall
Burgess et al. Physical properties of hydrogen sulfide‐water mixtures
JPS55122869A (en) Coating method for hafnium carbide (hfc)
JPS57158370A (en) Formation of metallic thin film
JPS56123377A (en) Plasma cleaning and etching method
JPS5426788A (en) Metering system for water vapor in gases
JPS57123969A (en) Formation of zinc oxide film by vapor phase method using plasma
JPS5575945A (en) Optical fiber coating method
JPS5767009A (en) Formation of film
JPS5630590A (en) Production of floor heating panel
CN109399618A (zh) 一种制备车用石墨烯的反应装置
JPS558485A (en) Production of coated super hard metal member
ES476878A1 (es) Procedimiento para la produccion de un gas combustible que contiene metano.
Halstead et al. Thermal hydrogenation of ethylene
JPS5558364A (en) Ultra hard alloy coated composite compounds
JPS5517346A (en) Synthetic method of urea
JPS5289582A (en) Gaseous phase peactor
GB1406020A (en) Method of producing thin coating film on substrates
JPS5518077A (en) Device for growing film under gas
Egashira et al. Modeling and simulation of blanket chemical vapor deposition of WSix from WF6/Si2H6
JPS54141381A (en) Batch type reactor and reaction method
JPS5471096A (en) Method of producing reducing gas
JPS5374882A (en) Manufacture of gas discharge panel
Cao et al. A Study of Gas Boronizing Process