JPS55121436A - Heat resistant photoresist composition and manufacture thereof - Google Patents
Heat resistant photoresist composition and manufacture thereofInfo
- Publication number
- JPS55121436A JPS55121436A JP2940579A JP2940579A JPS55121436A JP S55121436 A JPS55121436 A JP S55121436A JP 2940579 A JP2940579 A JP 2940579A JP 2940579 A JP2940579 A JP 2940579A JP S55121436 A JPS55121436 A JP S55121436A
- Authority
- JP
- Japan
- Prior art keywords
- aromatic
- photoresist composition
- sensitizer
- polymer
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 125000003118 aryl group Chemical group 0.000 abstract 3
- 229920000642 polymer Polymers 0.000 abstract 3
- OOCCDEMITAIZTP-QPJJXVBHSA-N (E)-cinnamyl alcohol Chemical compound OC\C=C\C1=CC=CC=C1 OOCCDEMITAIZTP-QPJJXVBHSA-N 0.000 abstract 1
- WOGITNXCNOTRLK-VOTSOKGWSA-N (e)-3-phenylprop-2-enoyl chloride Chemical compound ClC(=O)\C=C\C1=CC=CC=C1 WOGITNXCNOTRLK-VOTSOKGWSA-N 0.000 abstract 1
- IAHOUQOWMXVMEH-UHFFFAOYSA-N 2,4,6-trinitroaniline Chemical compound NC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O IAHOUQOWMXVMEH-UHFFFAOYSA-N 0.000 abstract 1
- LOCWBQIWHWIRGN-UHFFFAOYSA-N 2-chloro-4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1Cl LOCWBQIWHWIRGN-UHFFFAOYSA-N 0.000 abstract 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 abstract 1
- OOCCDEMITAIZTP-UHFFFAOYSA-N allylic benzylic alcohol Natural products OCC=CC1=CC=CC=C1 OOCCDEMITAIZTP-UHFFFAOYSA-N 0.000 abstract 1
- -1 aromatic amino compound Chemical class 0.000 abstract 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 abstract 1
- JUVGLPRIQOJMIR-UHFFFAOYSA-N oxiran-2-ylmethyl 3-phenylprop-2-enoate Chemical compound C=1C=CC=CC=1C=CC(=O)OCC1CO1 JUVGLPRIQOJMIR-UHFFFAOYSA-N 0.000 abstract 1
- 239000002798 polar solvent Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical group [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 abstract 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2940579A JPS55121436A (en) | 1979-03-15 | 1979-03-15 | Heat resistant photoresist composition and manufacture thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2940579A JPS55121436A (en) | 1979-03-15 | 1979-03-15 | Heat resistant photoresist composition and manufacture thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55121436A true JPS55121436A (en) | 1980-09-18 |
| JPS6116971B2 JPS6116971B2 (enrdf_load_stackoverflow) | 1986-05-02 |
Family
ID=12275217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2940579A Granted JPS55121436A (en) | 1979-03-15 | 1979-03-15 | Heat resistant photoresist composition and manufacture thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55121436A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0619757U (ja) * | 1992-05-19 | 1994-03-15 | 啓恵 門脇 | 手 袋 |
-
1979
- 1979-03-15 JP JP2940579A patent/JPS55121436A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0619757U (ja) * | 1992-05-19 | 1994-03-15 | 啓恵 門脇 | 手 袋 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6116971B2 (enrdf_load_stackoverflow) | 1986-05-02 |
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