JPS55117142A - Image duplicating material and image duplicating method - Google Patents

Image duplicating material and image duplicating method

Info

Publication number
JPS55117142A
JPS55117142A JP2396979A JP2396979A JPS55117142A JP S55117142 A JPS55117142 A JP S55117142A JP 2396979 A JP2396979 A JP 2396979A JP 2396979 A JP2396979 A JP 2396979A JP S55117142 A JPS55117142 A JP S55117142A
Authority
JP
Japan
Prior art keywords
photo
intermediate layer
absorbing agents
active ray
sum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2396979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6332176B2 (enrdf_load_stackoverflow
Inventor
Setsuo Imai
Satoshi Imahashi
Minoru Fukuda
Eiji Yoshimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP2396979A priority Critical patent/JPS55117142A/ja
Publication of JPS55117142A publication Critical patent/JPS55117142A/ja
Publication of JPS6332176B2 publication Critical patent/JPS6332176B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2396979A 1979-02-28 1979-02-28 Image duplicating material and image duplicating method Granted JPS55117142A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2396979A JPS55117142A (en) 1979-02-28 1979-02-28 Image duplicating material and image duplicating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2396979A JPS55117142A (en) 1979-02-28 1979-02-28 Image duplicating material and image duplicating method

Publications (2)

Publication Number Publication Date
JPS55117142A true JPS55117142A (en) 1980-09-09
JPS6332176B2 JPS6332176B2 (enrdf_load_stackoverflow) 1988-06-28

Family

ID=12125371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2396979A Granted JPS55117142A (en) 1979-02-28 1979-02-28 Image duplicating material and image duplicating method

Country Status (1)

Country Link
JP (1) JPS55117142A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130342A (ja) * 1982-01-29 1983-08-03 Toppan Printing Co Ltd 露光方法
FR2600434A1 (fr) * 1986-06-23 1987-12-24 Fuji Photo Film Co Ltd Materiau de formation d'image
JPH06295062A (ja) * 1993-10-01 1994-10-21 Kimoto & Co Ltd 製版用感光材料

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130342A (ja) * 1982-01-29 1983-08-03 Toppan Printing Co Ltd 露光方法
FR2600434A1 (fr) * 1986-06-23 1987-12-24 Fuji Photo Film Co Ltd Materiau de formation d'image
JPH06295062A (ja) * 1993-10-01 1994-10-21 Kimoto & Co Ltd 製版用感光材料

Also Published As

Publication number Publication date
JPS6332176B2 (enrdf_load_stackoverflow) 1988-06-28

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