JPS55115253A - Sputtering ion pump - Google Patents
Sputtering ion pumpInfo
- Publication number
- JPS55115253A JPS55115253A JP2169479A JP2169479A JPS55115253A JP S55115253 A JPS55115253 A JP S55115253A JP 2169479 A JP2169479 A JP 2169479A JP 2169479 A JP2169479 A JP 2169479A JP S55115253 A JPS55115253 A JP S55115253A
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- pump
- wall
- shield plate
- feeder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Tubes For Measurement (AREA)
Abstract
PURPOSE: To shorten the time of start-up by confining discharge in pump element under low vacuum condition to prevent the lowering of exhausting speed and also to suppress the discharge of excessive gas through the wall of pump container.
CONSTITUTION: The current leading-in terminal 2' and the feeder 3', to which the voltage inside a pump is applied, are covered with the discharge shield plate 7 of a conductor, and also the pump element 4' is covered with the discharge shield mesh 8 of a conductor. The discharge shield plate 7 is connected electrically to the pump container 1' so that it can be kept at earthing potential. The high-tention application portion of the electrode and feeder 3' on the vacuum side of the current leading-in terminal 2' is arranged in a narrow space between the inner wall of the pump container 1' and the discharge shield plate provided in the face of the inner wall. The space distance between them is set up to less than the width of the cathode dark space of glow discharge in the pressure region of 10-2W10-3 Torr.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2169479A JPS55115253A (en) | 1979-02-26 | 1979-02-26 | Sputtering ion pump |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2169479A JPS55115253A (en) | 1979-02-26 | 1979-02-26 | Sputtering ion pump |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55115253A true JPS55115253A (en) | 1980-09-05 |
JPS636978B2 JPS636978B2 (en) | 1988-02-15 |
Family
ID=12062164
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2169479A Granted JPS55115253A (en) | 1979-02-26 | 1979-02-26 | Sputtering ion pump |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55115253A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009059743A (en) * | 2007-08-30 | 2009-03-19 | Shimadzu Corp | Peltier cooling type semiconductor x-ray detector |
-
1979
- 1979-02-26 JP JP2169479A patent/JPS55115253A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009059743A (en) * | 2007-08-30 | 2009-03-19 | Shimadzu Corp | Peltier cooling type semiconductor x-ray detector |
Also Published As
Publication number | Publication date |
---|---|
JPS636978B2 (en) | 1988-02-15 |
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