JPS55115253A - Sputtering ion pump - Google Patents

Sputtering ion pump

Info

Publication number
JPS55115253A
JPS55115253A JP2169479A JP2169479A JPS55115253A JP S55115253 A JPS55115253 A JP S55115253A JP 2169479 A JP2169479 A JP 2169479A JP 2169479 A JP2169479 A JP 2169479A JP S55115253 A JPS55115253 A JP S55115253A
Authority
JP
Japan
Prior art keywords
discharge
pump
wall
shield plate
feeder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2169479A
Other languages
Japanese (ja)
Other versions
JPS636978B2 (en
Inventor
Shinji Osako
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP2169479A priority Critical patent/JPS55115253A/en
Publication of JPS55115253A publication Critical patent/JPS55115253A/en
Publication of JPS636978B2 publication Critical patent/JPS636978B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE: To shorten the time of start-up by confining discharge in pump element under low vacuum condition to prevent the lowering of exhausting speed and also to suppress the discharge of excessive gas through the wall of pump container.
CONSTITUTION: The current leading-in terminal 2' and the feeder 3', to which the voltage inside a pump is applied, are covered with the discharge shield plate 7 of a conductor, and also the pump element 4' is covered with the discharge shield mesh 8 of a conductor. The discharge shield plate 7 is connected electrically to the pump container 1' so that it can be kept at earthing potential. The high-tention application portion of the electrode and feeder 3' on the vacuum side of the current leading-in terminal 2' is arranged in a narrow space between the inner wall of the pump container 1' and the discharge shield plate provided in the face of the inner wall. The space distance between them is set up to less than the width of the cathode dark space of glow discharge in the pressure region of 10-2W10-3 Torr.
COPYRIGHT: (C)1980,JPO&Japio
JP2169479A 1979-02-26 1979-02-26 Sputtering ion pump Granted JPS55115253A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2169479A JPS55115253A (en) 1979-02-26 1979-02-26 Sputtering ion pump

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2169479A JPS55115253A (en) 1979-02-26 1979-02-26 Sputtering ion pump

Publications (2)

Publication Number Publication Date
JPS55115253A true JPS55115253A (en) 1980-09-05
JPS636978B2 JPS636978B2 (en) 1988-02-15

Family

ID=12062164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2169479A Granted JPS55115253A (en) 1979-02-26 1979-02-26 Sputtering ion pump

Country Status (1)

Country Link
JP (1) JPS55115253A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009059743A (en) * 2007-08-30 2009-03-19 Shimadzu Corp Peltier cooling type semiconductor x-ray detector

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009059743A (en) * 2007-08-30 2009-03-19 Shimadzu Corp Peltier cooling type semiconductor x-ray detector

Also Published As

Publication number Publication date
JPS636978B2 (en) 1988-02-15

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